Arrangement for determining the depth of into the surface of a substrate on which at least one layer of a material which is formed from the substrate material, depressions

摘要

The invention relates to an arrangement for determining the depth of into the surface of a substrate on which at least one layer is formed, depressions. In this case, a plurality of detectors, the to the spatially resolved spectral analysis of electromagnetic radiation are formed within a wavelength interval present. The detectors are connected to an evaluation unit and arranged in such a way that radiation emitted by the radiation source impinges on the detectors. The irradiation is carried out on a surface, of which the electromagnetic radiation reflected by the surface is transmitted or. The evaluation unit is designed in such a way that the location - and waves lengths, in the operative position of the recorded measured signals of the detectors within a wavelength interval for individual location points can be detected are. At a plurality of positions detected measurement signals are associated with a partial area. On the basis of this location - and waves lengths, in the operative position of the measurement signals detected, a comparison with previously determined measured values, which in an analogous manner to comparative patterns are carried out. Given adequate agreement, the depth can be determined.