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A PLASMA TREATMENT METHOD TO MEET LINE EDGE ROUGHNESS AND OTHER INTEGRATION OBJECTIVES
A PLASMA TREATMENT METHOD TO MEET LINE EDGE ROUGHNESS AND OTHER INTEGRATION OBJECTIVES
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机译:满足线边缘粗糙度和其他集成目标的等离子处理方法
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摘要
Provided is a method of patterning a layer on a substrate using an integration scheme, the method comprising: disposing a substrate having a structure pattern layer, a neutral layer, and an underlying layer, the structure pattern layer comprising a first material and a second material; performing a first treatment process using a first process gas mixture to form a first pattern, the first process gas comprising a mixture of CxHyFz and argon; performing a second treatment process using a second process gas mixture to form a second pattern, the second process gas comprising a mixture of low oxygen-containing gas and argon; concurrently controlling selected two or more operating variables of the integration scheme in order to achieve target integration objectives.
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