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DELIVERY DEVICE, SUBSTRATE ION-IMPLANTING SYSTEM AND METHOD THEREOF

机译:输送装置,基质离子注入系统及其方法

摘要

The present disclosure relates to a delivery device, a substrate ion-implanting system and a substrate ion-implanting method. The substrate ion-implanting system includes: a substrate-supporting table and an ion-implantation device connected to the substrate-supporting table. A substrate is movable from the substrate-supporting table into the ion-implantation device. The ion-implantation device includes an operation chamber, and the substrate is transferred to the operation chamber for implanting ions by the ion-implantation device. A transfer chamber is configured to transfer back the substrate after implanting the ions to the substrate-supporting table. By the above means, the present disclosure can improve the productivity of the substrate ion-implanting system.
机译:本发明涉及一种输送装置,基板离子注入系统和基板离子注入方法。基板离子注入系统包括:基板支撑台和连接到基板支撑台的离子注入装置。基板可从基板支撑台移动到离子注入装置中。离子注入装置包括工作室,并且基板通过离子注入装置被传送到用于注入离子的工作室。传送室被配置为在将离子注入到基板支撑台之后传送回基板。通过以上手段,本公开可以提高基板离子注入系统的生产率。

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