Laser-induced damage in dielectrics with nanosecond to subpicosecond pulses. I. Experimental. Part 1

摘要

The authors report extensive laser-induced damage threshold measurements on pure and multilayer dielectrics at 1053 and 526 mm for pulse durations, (tau), ranging from 140 fs to 1 ns. Qualitative differences in the morphology of damage and a departure from the diffusion-dominated (tau)(sup 1/2) scaling indicate that damage results from plasma formation and ablation for (tau)(le)10 ps and from conventional melting and boiling for (tau)>50 ps. A theoretical model based on electron production via multiphoton ionization, Joule heating, and collisional (avalanche) ionization is in good agreement with both the pulsewidth and wavelength scaling of experimental results.