首页> 美国政府科技报告 >Characterization Study of Conventional Chromium Films, Amorphous Bright Chromium Deposited (ABCD) Films, N+ Implanted ABCD Films and the Preparation of ABCD Films Using Propionic Acid as an Organic Additive
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Characterization Study of Conventional Chromium Films, Amorphous Bright Chromium Deposited (ABCD) Films, N+ Implanted ABCD Films and the Preparation of ABCD Films Using Propionic Acid as an Organic Additive

机译:常规铬薄膜,非晶光亮铬沉积(aBCD)薄膜,N +注入aBCD薄膜的表征研究和使用丙酸作为有机添加剂制备aBCD薄膜

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Electroplated chromium films are widely used and are extremely important in industrial processes because the films produced are hard, corrosion resistant, bright and have good adhesive properties. Unfortunately, the utilization of conventional Cr layers is limited to low-temperature applications (generally less than 500C) because they soften at elevated temperatures. This problem has been overcome through the development of the amorphous bright chromium deposition (ABCD) method. In the ABCD method organic compounds containing -CHO or -COOH groups are added to the electroplating bath, and the bath is operated under different conditions than the conventional Sargent bath. The resulting ABCD films have exceptional properties compared to conventional Cr films. Most importantly, the hardness of ABCD films increases greatly either by annealing at fairly low temperatures for long periods (2000C for 48 hrs) or higher temperatures for shorter periods (6000C for 1/2 hr) thereby opening new application areas for Cr layers.

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