Fabrication of Nanolaminates with Ultrathin Nanolayers Using Atomic Layer Deposition: Nucleation & Growth Issues

摘要

This AFOSR grant concentrated on the fabrication of nanolaminates with ultrathin nanolayers using atomic layer deposition (ALD) and molecular layer deposition (MLD) techniques. Nanolaminates are multilayered thin film structures with nanometer dimensions and very high interfacial density. These multilayer structures can display novel properties that can be optimized by manipulating the thickness and composition of the individual nanolayers. During this grant, the research examined nucleation and growth issues involved in the fabrication of W/Al203 nanolaminates. These studies are important because W/Al203 nanolaminates are important for thermal barrier coatings and x-ray mirrors. Subsequent studies examined Si02/Al203 nanolaminates for gas diffusion barriers on polymers. The brittleness of these Si02/Al203 nanolaminates motivated new work on molecular layer deposition (MLD) to develop flexible nanolaminate films using polymeric interlayers. New MLD growth methods were used to fabricate organic-inorganic nanolaminates that may serve as excellent flexible coatings.