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Theoretical investigations of Ge nanowires grown along the [110] and [111] directions

机译:沿[110]和[111]方向生长的Ge纳米线的理论研究

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An ab initio study of Ge nanowires (GeNWs) oriented along [110] and [111] directions is performed for H-passivated and non-passivated wires with diameters up to 3.5 nm. GeNWs grown in the [110] direction present a direct energy gap and in the [111] direction the energy gap is indirect, even for small diameters. The highest occupied molecular orbital and lowest unoccupied molecular orbital (HOMO-LUMO) gap scales with diameter, d, as propor. to d~(-0.9) and d~(-1.1) for the [110] and [111] growth directions, respectively. Consequently for the same diameter GeNWs grown in the [110] direction present a smaller gap than nanowires grown in the [111] direction.
机译:对直径最大为3.5 nm的H钝化和非钝化导线进行了从头开始研究沿[110]和[111]方向取向的Ge纳米线(GeNWs)。在[110]方向上生长的GeNW呈现出直接的能隙,而在[111]方向上则形成间接的能隙,即使对于较小的直径也是如此。直径为d的最大占据分子轨道和最小未占据分子轨道(HOMO-LUMO)间隙标度。 [110]和[111]生长方向分别为d〜(-0.9)和d〜(-1.1)。因此,对于相同直径的GeNW,在[110]方向上生长的间隙比在[111]方向上生长的纳米线的间隙小。

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