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Effect of microwave annealing temperatures on lead zirconate titanate thin films

机译:微波退火温度对钛酸锆钛酸铅薄膜的影响

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摘要

Lead zirconate titanate (Pb_(1.1)(Zr_(0.52)Ti_(0.48))O_3) thin films of thickness 260 nm on Pt/Ti/SiO_2/Si substrates were densified by 2.45 GHz microwave annealing. The PZT thin films were annealed at various annealing temperatures from 400 to 700 deg C for 30 min. X-ray diffraction showed that the pyrochlore phase was transformed to the perovskite phase at 450 deg C and the film was fully crystallized. The secondary (again pyrochlore) phase was observed in the PZT thin films, which were annealed above 550 deg C. The surface morphologies were changed above 550 deg C of the PZT thin films due to the secondary phase. Higher dielectric constant (epsilon_r) and lower dielectric loss coercive field (E_c) were achieved for the 450 deg C film than for the other annealed films.
机译:通过2.45 GHz微波退火对Pt / Ti / SiO_2 / Si衬底上厚度为260 nm的锆酸钛酸铅(Pb_(1.1)(Zr_(0.52)Ti_(0.48))O_3薄膜进行了致密化处理。将PZT薄膜在400到700摄氏度的各种退火温度下退火30分钟。 X射线衍射表明,烧绿石相在450℃下转变为钙钛矿相,并且膜完全结晶。在550℃以上退火的PZT薄膜中观察到第二相(再次为烧绿石)相。由于第二相,在550℃以上PZT薄膜的表面形态发生了变化。与其他退火薄膜相比,在450摄氏度的薄膜中获得了更高的介电常数(ε_r)和更低的介电损耗矫顽场(E_c)。

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