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Comparison of interferometrical and stylus step height measurements on rough surfaces

机译:Comparison of interferometrical and stylus step height measurements on rough surfaces

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摘要

For interferometric measurements of step height standards with different roughness on either the upper or base levels, a shift of the reflection plane and hence a different height compared with a mechanical stylus measurement is assumed. This paper investigates an evaporated aluminium step height standard consisting of six steps with different roughnesses of the upper levels. Comparison measurements between a high-resolution stylus instrument, an interference microscope with two different objectives and two high-precision interferometers have been made. The agreement between the measurements of the two interference microscopes and the phase shifting interferometer was very good. The maximum deviation was less than 9 nm for steps up to 8 mu m height. Comparing the optically and the mechanically measured step heights, no systematic height differences were observable.

著录项

  • 来源
    《nanotechnology》 |1995年第3期|81-86|共页
  • 作者

    U Brand;

  • 作者单位

    Phys.-Tech. Bundesanstalt, Braunschweig, Germany;

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  • 原文格式 PDF
  • 正文语种 英语
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