Improved instrument for medium energy electron diffraction and microscopy of surfaces

摘要

The REMEDIE system for reflection electron microscopy and electron diffraction at intermediate energies (0.5ndash;20 keV) has been rebuilt with an improved imaging resolution of better than 10 nm, a convenient and versatile system for observation diffraction patterns and provision for specimen preparation and treatment suitable for surface structural studies. The current capabilities of the instrument are illustrated by results obtained from cleaved and annealed silicon (111) surfaces with or without thin deposited silver and gold layers.