High resolution electron beam fabrication: a brief review of experimental studies that began at Cambridge University in 1962

摘要

SUMMARYElectron beam fabrication studies with the scanning electron microscope began at Cambridge University in 1962. Early experiments demonstrated that structures could be made that were smaller than could be made by other methods, but it was not until several years later at IBM Research that useful devices with these smaller dimensions were made. It was even later (1981) before the resolution limits of electron beam lithography with conventional resist were measured. It is now understood that with conventional resists, electron/resist interaction effects limit the minimum structure size to about 10 nm. Newer methods that involve the direct sublimation of materials such as NaCl and LiF allow structures down to about 1 nm to be made.