Ultrahighhyphen;vacuum evaporation system with lowhyphen;temperature measurement capability

摘要

An ultrahighhyphen;vacuum system has been constructed and outfitted with molecular beam sources and surface analysis equipment lsqb;Auger electron spectroscopy (AES) and reflection highhyphen;energy electron diffraction (RHEED)rsqb;. The sample insertion system is a lowhyphen;temperature apparatus. With this equipment, films can be grown in the 10minus;11ndash;10minus;9hyphen;Torr range with substrate temperatures at 4.2ndash;20 K. A modification of the system will permit growth at elevated temperatures followed byinsitulowhyphen;temperature measurements. The design of the lowhyphen;temperature apparatus permits extensive measurements to be taken in an environment in which the temperature can be controlled over a range from 0.3 to 300 K and the magnetic field from 10minus;7to 6 T.