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机译:激光聚焦原子沉积和极端紫外线干扰光刻方法的混合应用,用于制造自适应纳米瘤
Tongji Univ Sch Phys Sci &
Engn Shanghai 200092 Peoples R China;
Chinese Acad Sci Shanghai Adv Res Inst Shanghai Synchrotron Radiat Facil Shanghai 201204 Peoples R China;
Tongji Univ Sch Phys Sci &
Engn Shanghai 200092 Peoples R China;
Chinese Acad Sci Shanghai Adv Res Inst Shanghai Synchrotron Radiat Facil Shanghai 201204 Peoples R China;
Chinese Acad Sci Shanghai Adv Res Inst Shanghai Synchrotron Radiat Facil Shanghai 201204 Peoples R China;
Chinese Acad Sci Shanghai Adv Res Inst Shanghai Synchrotron Radiat Facil Shanghai 201204 Peoples R China;
Chinese Acad Sci Shanghai Adv Res Inst Shanghai Synchrotron Radiat Facil Shanghai 201204 Peoples R China;
Phys Tech Bundesanstalt D-38116 Braunschweig Germany;
Phys Tech Bundesanstalt D-38116 Braunschweig Germany;
Tongji Univ Sch Phys Sci &
Engn Shanghai 200092 Peoples R China;
Tongji Univ Sch Phys Sci &
Engn Shanghai 200092 Peoples R China;
laser-focused atomic deposition (LFAD); EUV interference lithography; grating; uniformity; pitch; traceability; metrological scanning probe microscopy (SPM);
机译:通过组合激光聚焦原子沉积和X射线干扰光刻制造的一种新型的纳米级参考光栅及其用于校准扫描电子显微镜的用途
机译:纳米级图案化:原子力显微镜和极紫外干扰光刻
机译:使用Fabry-Perot干涉滤光片的用于极端紫外光刻的混合型衰减相移掩模的光学设计
机译:激光聚焦原子沉积Cr纳入衍射效率研究
机译:强烈的毛细管放电等离子体极紫外光源,用于极紫外光刻和其他极紫外成像应用。
机译:激光聚焦原子沉积制备的纳米间距标准品的准确性
机译:客人编辑:极端紫外线干扰光刻
机译:更新sEmaTECH 0.5 Na极紫外光刻(EUVL)微场曝光工具(mET)。会议:spIE - 极紫外(EUV)光刻V,加利福尼亚州圣何塞,2014年2月23日;相关信息:Journal.publication日期:90481m。