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首页> 外文期刊>Nanotechnology >Probing negatively charged and neutral excitons in MoS2/hBN and hBN/MoS2/hBN van der Waals heterostructures
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Probing negatively charged and neutral excitons in MoS2/hBN and hBN/MoS2/hBN van der Waals heterostructures

机译:MOS2 / HBN和HBN / MOS2 / HBN范德瓦斯异质结构探测带负电和中性激子

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摘要

High-quality van der Waals heterostructures assembled from hBN-encapsulated monolayer transition metal dichalcogenides enable observations of subtle optical and spin-valley properties whose identification was beyond the reach of structures exfoliated directly on standard SiO2/Si substrates. Here, we describe different van der Waals heterostructures based on uncapped single-layer MoS2 stacked onto hBN layers of different thicknesses and hBN-encapsulated monolayers. Depending on the doping level, they reveal the fine structure of excitonic complexes, i.e. neutral and charged excitons. In the emission spectra of a particular MoS2/hBN heterostructure without an hBN cap we resolve two trion peaks, T-1 and T-2, energetically split by about 10 meV, resembling the pair of singlet and triplet trion peaks (T-S and T-T) in tungsten-based materials. The existence of these trion features suggests that monolayer MoS2 has a dark excitonic ground state, despite having a 'bright' single-particle arrangement of spin-polarized conduction bands. In addition, we show that the effective excitonic g-factor significantly depends on the electron concentration and reaches the lowest value of -2.47 for hBN-encapsulated structures, which reveals a nearly neutral doping regime. In the uncapped MoS2 structures, the excitonic g-factor varies from -1.15 to -1.39 depending on the thickness of the bottom hBN layer and decreases as a function of rising temperature.
机译:由hBN封装的单层过渡金属二醇化物组装而成的高质量范德华异质结构能够观察到微妙的光学和自旋谷特性,其识别超出了直接在标准SiO2/Si衬底上剥落的结构的范围。在这里,我们描述了不同的范德瓦尔斯异质结构,基于不同厚度的hBN层和hBN封装单分子膜上堆叠的无盖单层MoS2。根据掺杂水平,它们揭示了激子配合物的精细结构,即中性激子和带电激子。在没有hBN帽的特定MoS2/hBN异质结构的发射光谱中,我们解析出两个三重态峰T-1和T-2,能量分裂约10 meV,类似于钨基材料中的一对单重态和三重态三重态峰(T-S和T-T)。这些三重子特征的存在表明,单层MoS2具有暗激子基态,尽管它具有自旋极化导带的“明亮”单粒子排列。此外,我们还发现,有效激子g因子显著依赖于电子浓度,对于hBN封装结构,其最低值为-2.47,这表明了一个接近中性的掺杂区。在无盖MoS2结构中,激子g因子随底部hBN层的厚度变化在-1.15到-1.39之间,并随着温度的升高而降低。

著录项

  • 来源
    《Nanotechnology》 |2021年第14期|共10页
  • 作者单位

    Wroclaw Univ Sci &

    Technol Dept Expt Phys Wybrzeze Wyspianskiego 27 PL-50370 Wroclaw Poland;

    Wroclaw Univ Sci &

    Technol Dept Expt Phys Wybrzeze Wyspianskiego 27 PL-50370 Wroclaw Poland;

    Wroclaw Univ Sci &

    Technol Dept Theoret Phys Wybrzeze Wyspianskiego 27 PL-50370 Wroclaw Poland;

    Univ Warsaw Inst Expt Phys Fac Phys Pasteura 5 PL-02093 Warsaw Poland;

    Univ Warsaw Inst Expt Phys Fac Phys Pasteura 5 PL-02093 Warsaw Poland;

    Tech Univ Dortmund Expt Phys 2 D-44227 Dortmund Germany;

    Tech Univ Dortmund Expt Phys 2 D-44227 Dortmund Germany;

    Natl Inst Mat Sci Tsukuba Ibaraki 3050044 Japan;

    Natl Inst Mat Sci Tsukuba Ibaraki 3050044 Japan;

    Natl Taiwan Univ Sci &

    Technol Dept Elect Engn Taipei 106 Taiwan;

    Wroclaw Univ Sci &

    Technol Dept Theoret Phys Wybrzeze Wyspianskiego 27 PL-50370 Wroclaw Poland;

    Univ Ottawa Dept Phys Ottawa ON K1N 6N5 Canada;

    Wroclaw Univ Sci &

    Technol Dept Expt Phys Wybrzeze Wyspianskiego 27 PL-50370 Wroclaw Poland;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 特种结构材料;
  • 关键词

    transition metal dichalcogenides monolayers; molybdenum disulfide; exciton; trion; Zeeman g-factor;

    机译:过渡金属二醇盐单分子膜;二硫化钼;激子;特里翁;塞曼g因子;

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