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Many-particle induced band renormalization processes in few- and mono-layer MoS2

机译:几种和单层MOS2中的许多粒子诱导的带重整过程

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摘要

Band renormalization effects play a significant role for two-dimensional (2D) materials in designing a device structure and customizing their optoelectronic performance. However, the intrinsic physical mechanism about the influence of these effects cannot be revealed by general steady-state studies. Here, band renormalization effects in organic superacid treated monolayer MoS2, untreated monolayer MoS2 and few-layer MoS2 are quantitatively analyzed by using broadband femtosecond transient absorption spectroscopy. In comparison with the untreated monolayer, organic superacid treated monolayer MoS2 maintains a direct bandgap structure with two thirds of carriers populated at K valley, even when the initial exciton density is as high as 2.05 x 10(14) cm(-2) (under 400 nm excitations). While for untreated monolayer and few-layer MoS2, many-particle induced band renormalizations lead to a stronger imbalance for the carrier population between K and Q valleys in k space, and the former experiences a direct-to-indirect bandgap transition when the initial exciton density exceeds 5.0 x 10(13) cm(-2) (under 400 nm excitations). Those many-particle induced band renormalization processes further suggest a band-structure-controlling method in practical 2D devices.
机译:带重正化效应对于二维材料在设计器件结构和定制其光电性能方面起着重要作用。然而,一般的稳态研究无法揭示这些效应影响的内在物理机制。本文用宽带飞秒瞬态吸收光谱法定量分析了有机超强酸处理的单层MoS2、未处理的单层MoS2和少量MoS2中的能带重整化效应。与未处理的单层膜相比,有机超强酸处理的单层膜MoS2保持了直接带隙结构,三分之二的载流子填充在K谷,即使初始激子密度高达2.05 x 10(14)cm(-2)(在400 nm激发下)。而对于未经处理的单层和少层MoS2,许多粒子诱导的能带重整化会导致K空间中K谷和Q谷之间的载流子数出现更强烈的不平衡,并且当初始激子密度超过5.0 x 10(13)cm(-2)(在400 nm激发下)时,前者会经历直接到间接的带隙跃迁。这些多粒子诱导的能带重整化过程进一步提出了在实际二维器件中控制能带结构的方法。

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  • 来源
    《Nanotechnology》 |2021年第13期|共10页
  • 作者单位

    Jilin Univ Coll Elect Sci &

    Engn State Key Lab Integrated Optoelect Changchun 130012 Peoples R China;

    Shenzhen Univ Int Collaborat Lab Mat Optoelect Sci &

    Technol 2D Minist Educ Inst Microscale Optoelect Shenzhen 518060 Peoples R China;

    Jilin Univ Coll Elect Sci &

    Engn State Key Lab Integrated Optoelect Changchun 130012 Peoples R China;

    Jilin Univ Coll Elect Sci &

    Engn State Key Lab Integrated Optoelect Changchun 130012 Peoples R China;

    Jilin Univ Coll Elect Sci &

    Engn State Key Lab Integrated Optoelect Changchun 130012 Peoples R China;

    Jilin Univ Coll Elect Sci &

    Engn State Key Lab Integrated Optoelect Changchun 130012 Peoples R China;

    Jilin Univ Coll Elect Sci &

    Engn State Key Lab Integrated Optoelect Changchun 130012 Peoples R China;

    Jilin Univ Coll Elect Sci &

    Engn State Key Lab Integrated Optoelect Changchun 130012 Peoples R China;

    Natl Univ Singapore Dept Phys Singapore 117542 Singapore;

    Natl Univ Singapore Dept Elect &

    Comp Engn Singapore 117548 Singapore;

    Tsinghua Univ Dept Precis Instrument State Key Lab Precis Measurement &

    Instruments Beijing 100084 Peoples R China;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 特种结构材料;
  • 关键词

    monolayer MoS2; band renormalization; broadband femtosecond transient absorption; direct-to-indirect bandgap transition; organic superacid treatment;

    机译:单层MoS2;能带重整化;宽带飞秒瞬态吸收;直接到间接带隙跃迁;有机超强酸处理;

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