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首页> 外文期刊>Angewandte Chemie >Strong sigma-Hole Activation on Icosahedral Carborane Derivatives for a Directional Halide Recognition
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Strong sigma-Hole Activation on Icosahedral Carborane Derivatives for a Directional Halide Recognition

机译:ICOSAHEDRAL碳硼烷衍生物对定向卤化物识别的强烈SIGMA-HOL激活

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摘要

Crystal engineering based on sigma-hole interactions is an emerging approach for realization of new materials with higher complexity. Neutral inorganic clusters derived from 1,2-dicarba-closo-dodecaborane, substituted with -SeMe, -TeMe, and -I moieties on both skeletal carbon vertices are experimentally demonstrated herein as outstanding chalcogen- and halogen-bond donors. In particular, these new molecules strongly interact with halide anions in the solid-state. The halide ions are coordinated by one or two donor groups (mu(1)- and mu(2)-coordinations), to stabilize a discrete monomer or dimer motifs to 1D supramolecular zig-zag chains. Crucially, the observed chalcogen bond and halogen bond interactions feature remarkably short distances and high directionality. Electrostatic potential calculations further demonstrate the efficiency of the carborane derivatives, with V-s,V-max being similar or even superior to that of reference organic halogen-bond donors, such as iodopentafluorobenzene.
机译:基于sigma-空穴相互作用的晶体工程是实现更高复杂性新材料的一种新兴方法。从1,2-二氨基-closo-十二硼烷衍生的中性无机团簇,在两个骨架碳顶点上被-SeMe、-TeMe和-I部分取代,实验证明,它们是出色的硫键和卤素键供体。特别是,这些新分子在固态中与卤化物阴离子强烈相互作用。卤化物离子由一个或两个施主基团(mu(1)-和mu(2)-配位)配位,以将离散的单体或二聚体基序稳定为一维超分子之字形链。关键的是,观察到的硫键和卤素键相互作用具有显著的短距离和高方向性。静电势计算进一步证明了碳硼烷衍生物的效率,V-s、V-max与参考有机卤素键供体(如碘代五氟苯)的效率相似,甚至更高。

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