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首页> 外文期刊>ACS nano >Enhanced Exciton-Exciton Collisions in an Ultraflat Monolayer MoSe2 Prepared through Deterministic Flattening
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Enhanced Exciton-Exciton Collisions in an Ultraflat Monolayer MoSe2 Prepared through Deterministic Flattening

机译:通过确定性扁平化制备的超薄单层MOSE2中增强的激子激励碰撞

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摘要

Squeezing bubbles and impurities out of interlayer spaces by applying force through a few-layer graphene capping layer leads to van der Waals heterostructures with the ultratlat structure free from random electrostatic potential arising from charged impurities. Without the graphene capping layer, a squeezing process with an AFM tip induces applied-force-dependent charges of Delta n similar to 2 x 10(12) cm(-2) mu N-1 resulting in the significant intensity of trions in photoluminescence spectra of MoSe2 at low temperature. We found that a hBN/MoSe2/hBN prepared with the "graphene-capping-assisted AFM nano-squeezing method" shows a strong excitonic emission with negligible trion peak, and the residual line width of the exciton peak is only 2.2 meV, which is comparable to the homogeneous limit. Furthermore, in this high-quality sample, we found that the formation of biexciton occurs even at extremely low excitation power (Phi(ph) similar to 2.3 x 10(19) cm(-2) s(-1)) due to the enhanced collisions between excitons.
机译:通过对几层石墨烯覆盖层施加力,将气泡和杂质从层间空间挤压出来,从而形成范德华异质结构,这种超晶格结构不受带电杂质产生的随机静电势的影响。在没有石墨烯覆盖层的情况下,AFM尖端的压缩过程会产生与力相关的δn电荷,类似于2 x 10(12)cm(-2)μn-1,从而导致MoSe2在低温下的光致发光光谱中出现显著的三极强度。我们发现,用“石墨烯封端辅助AFM纳米压缩法”制备的hBN/MoSe2/hBN显示出强烈的激子发射,三重子峰可以忽略不计,激子峰的剩余线宽仅为2.2meV,与均匀极限相当。此外,在这个高质量的样品中,我们发现,由于激子之间的碰撞增强,即使在极低的激发功率(φ(ph)类似于2.3 x 10(19)cm(-2)s(-1))下,双激子也会形成。

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