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Time-Dependent Screening Explains the Ultrafast Excitonic Signal Rise in 2D Semiconductors

机译:时间依赖筛选解释了2D半导体中超快激发力信号上升

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We calculate the time evolution of the transient reflection signal in an MoS2 monolayer on a SiO2/Si substrate using first-principles out-of-equilibrium real-time methods. Our simulations provide a simple and intuitive physical picture for the delayed, yet ultrafast, evolution of the signal whose rise time depends on the excess energy of the pump laser: at laser energies above the A- and Bexciton, the pump pulse excites electrons and holes far away from the K valleys in the first Brillouin zone. Electron-phonon and hole- phonon scattering lead to a gradual relaxation of the carriers toward small Active Excitonic Regions around K, enhancing the dielectric screening. The accompanying time-dependent band gap renormalization dominates over Pauli blocking and the excitonic binding energy renormalization. This explains the delayed buildup of the transient reflection signal of the probe pulse, in excellent agreement with recent experimental data. Our results show that the observed delay is not a unique signature of an exciton formation process but rather caused by coordinated carrier dynamics and its influence on the screening.
机译:我们使用第一性原理非平衡实时方法计算了SiO2/Si衬底上MoS2单层中瞬态反射信号的时间演化。我们的模拟为信号的延迟但超快演化提供了一个简单而直观的物理图像,其上升时间取决于泵浦光的过剩能量:在a-和Bexciton以上的激光能量下,泵浦光脉冲激发远离第一布里渊区K谷的电子和空穴。电子-声子和空穴-声子散射导致载流子向K附近的小激子区逐渐弛豫,增强了介电屏蔽。伴随的含时带隙重正化优于泡利阻塞和激子结合能重正化。这解释了探头脉冲瞬态反射信号的延迟累积,与最近的实验数据非常一致。我们的结果表明,观察到的延迟不是激子形成过程的唯一特征,而是由配位载流子动力学及其对屏蔽的影响引起的。

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