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首页> 外文期刊>Journal of mass spectrometry: JMS >Structural analysis of a compound despite the presence of an isobaric interference by using in-source Collision Induced Dissociation and tandem mass spectrometry
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Structural analysis of a compound despite the presence of an isobaric interference by using in-source Collision Induced Dissociation and tandem mass spectrometry

机译:化合物的结构分析尽管通过使用源碰撞诱导的解离和串联质谱法存在同感干扰

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摘要

The presence of an isobaric contaminant can drastically affect MS and MS/MS patterns leading to erroneous structural and quantitative analysis, which is a real challenge in mass spectrometry. Herein, we demonstrate that MS and MS/MS structural analysis of a compound can be successfully performed despite the presence of an isobaric interference with as low as few millidaltons mass difference by using pseudo-MS3. To this end, in-source collisional excitation (in-source CID) and the Survival Yield (SY) technique (energy-resolved collision induced dissociation MS/MS) were performed on two different source geometries: a Z-spray and an orthogonal spray (with a transfer capillary) ionization sources on two different mass spectrometers. By using soft ionization conditions, the SY curve for the mixture is a linear combination of the SY curves from the pure compounds demonstrating the presence of two components in the mixture. In the case of harsher ionization conditions, the SY curve of the mixture perfectly overlaps the SY curve from the pure analyte. This observation demonstrates the isobaric interference has been completely removed by in-source CID fragmentation, independently of the source design, leaving then the analyte precursor ions only. Therefore, by measuring the MS spectrum in harsh ionization conditions and according to SY criterium, the compound of interest can be made free from isobaric interference paving the way for, for example, unequivocal HPLC-MS as well as HPLC-MS/MS structural and quantitative analysis despite the presence of a co-eluting isobaric interference.
机译:等压污染物的存在会严重影响MS和MS/MS模式,导致错误的结构和定量分析,这在质谱分析中是一个真正的挑战。在此,我们证明,尽管存在等压干扰,但通过使用伪MS3,可以成功地对化合物进行MS和MS/MS结构分析,其质量差仅为几毫道尔顿。为此,在两个不同的质谱仪上,对两种不同的源几何结构:Z型喷雾和正交喷雾(带转移毛细管)电离源进行了源内碰撞激发(源内CID)和存活率(SY)技术(能量分辨碰撞诱导离解MS/MS)。通过使用软电离条件,混合物的SY曲线是证明混合物中存在两种组分的纯化合物的SY曲线的线性组合。在更苛刻的电离条件下,混合物的SY曲线与纯分析物的SY曲线完全重叠。这一观察结果表明,源内CID碎裂完全消除了等压干扰,与源设计无关,只留下分析物前体离子。因此,通过在苛刻的电离条件下测量MS光谱,并根据SY标准,可以使感兴趣的化合物不受等压干扰,从而为例如明确的HPLC-MS以及HPLC-MS/MS结构和定量分析铺平道路,尽管存在共洗脱等压干扰。

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