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Surface roughness and morphology evolution of optical glass with micro-cracks during chemical etching

机译:化学蚀刻中微裂纹光学玻璃的表面粗糙度和形态演化

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摘要

Chemical etching is usually utilized to measure, reduce, and remove the subsurface micro-cracks in optical components, which makes it significant to study the surface evolution of optical components during the etching process. Etching experiments were carried out for glass with artificial cracks and micro-cracks under different etching conditions. The etching rate was obtained, which is linear with the hydrofluoric acid (HF) concentration and greatly affected by etching temperature. By measuring the surface roughness (SR) and morphology of glasses after etching, it is found that the crack width always increases with etching time, while the crack depth remains unchanged after the crack is completely exposed. Meanwhile, the SR increases sharply at first, then increases slowly, and finally decreases with the increase of etching time. Considering the influence of HF concentration, etching temperature, and the diffusion coefficient on the etching rate, simulation models were established for etching trailing indent cracks (TICs) to further analyze the evolution of SR and morphology. The simulation results were compared with the experimental ones, also indicating that the maximum SR (Ra) increases greatly with the crack's aspect ratio and the model for analyzing the crack's morphology evolution is more reasonable. (C) 2017 Optical Society of America
机译:通常利用化学蚀刻来测量,减少和去除光学部件中的地下微裂缝,这使得在蚀刻工艺期间研究光学部件的表面展现是重要的。在不同蚀刻条件下对具有人工裂缝和微裂纹进行玻璃进行蚀刻实验。获得蚀刻速率,其与氢氟酸(HF)浓度线性和通过蚀刻温度大大影响。通过测量蚀刻后的表面粗糙度(SR)和眼镜的形态,发现裂缝宽度总是随着蚀刻时间而增加,而在裂缝完全暴露后裂纹深度保持不变。同时,首先,SR急剧增加,然后缓慢增加,最后随着蚀刻时间的增加而降低。考虑到HF浓度,蚀刻温度和扩散系数对蚀刻速率的影响,建立了模拟模型,用于蚀刻尾部凹痕裂缝(TICS),以进一步分析Sr和形态的演变。将模拟结果与实验结果进行比较,也表明最大Sr(Ra)随着裂缝的纵横比和分析裂缝形态演化的模型而增加,更加合理。 (c)2017年光学学会

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  • 来源
    《Applied optics》 |2017年第3期|共10页
  • 作者单位

    Xi An Jiao Tong Univ State Key Lab Mfg Syst Engn Xian 710049 Peoples R China;

    Xi An Jiao Tong Univ State Key Lab Mfg Syst Engn Xian 710049 Peoples R China;

    Xi An Jiao Tong Univ State Key Lab Mfg Syst Engn Xian 710049 Peoples R China;

    Xi An Jiao Tong Univ State Key Lab Mfg Syst Engn Xian 710049 Peoples R China;

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