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首页> 外文期刊>Applied optics >Effect of ion beam figuring and subsequent antireflective coating deposition on the surface absorption of CaF2 at 193 nm
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Effect of ion beam figuring and subsequent antireflective coating deposition on the surface absorption of CaF2 at 193 nm

机译:离子束图和随后的抗反射涂层沉积对193nm的CaF2表面吸收的影响

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摘要

The surface absorption of CaF2 at 193 nm after surface treatment by ion beam figuring (IBF) and the subsequent antireflective (AR) coating process was investigated by using the laser-induced deflection technique. In comparison to a standard pitch polishing, enhanced surface absorption (subsurface damage) is observed after IBF treatment. However, after AR coating deposition, the total surface absorption of IBF treated samples does not exceed values obtained for pitch polished samples. The experimental results provide indication that IBF treatment yields both fluorine displacement and deficiency in the CaF2 subsurface region, which is annealed during the coating process by the high temperature and the fluorine supply from the fluoride coating materials, respectively. (C) 2016 Optical Society of America
机译:通过使用激光诱导的偏转技术研究了通过离子束的表面处理(IBF)和随后的抗反射剂(AR)涂布方法后193nm的CaF2的表面吸收。 与标准间距抛光相比,在IBF处理后观察到增强的表面吸收(地下损伤)。 然而,在Ar涂层沉积之后,IBF处理的样品的总表面吸收不超过用于俯仰抛光样品的值。 实验结果提供了IBF处理产生CAF2地下区域的氟位移和缺陷,其在涂布过程中分别通过高温和来自氟化物涂层材料的氟供应在涂布过程中退火。 (c)2016年美国光学学会

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  • 来源
    《Applied optics》 |2017年第4期|共5页
  • 作者单位

    Leibniz Inst Photon Technol Albert Einstein Str 9 D-07745 Jena Germany;

    Leibniz Inst Photon Technol Albert Einstein Str 9 D-07745 Jena Germany;

    JENOPTIK Opt Syst GmbH Goschwitzer Str 25 D-07745 Jena Germany;

    JENOPTIK Opt Syst GmbH Goschwitzer Str 25 D-07745 Jena Germany;

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  • 正文语种 eng
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