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Invalid phase values removal method for absolute phase recovery

机译:无效的相位值删除方法,用于绝对相位恢复

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摘要

A novel approach is presented for more effectively removing invalid phase values in absolute phase recovery. The approach is based on a detailed study involving the types and cases of invalid phase values. Meanwhile, some commonalities of the existing removal algorithms also are thoroughly analyzed. It is well known that rough absolute phase and fringe order maps can very easily be obtained by temporal phase unwrapping techniques. After carefully analyzing the components and fringe order distribution of the rough fringe order map, the proposed method chiefly adopts an entirely new strategy to refine a pure fringe order map. The strategy consists of three parts: (1) the square of an image gradient, (2) subregion areas of the binary image, and (3) image decomposition and composition. In combination with the pure fringe order map and a removal criterion, the invalid phase values can be identified and filtered out from the rough absolute phase map. This new strategy not only gets rid of the limitations of traditional removal methods but also has a two-fold function. The paper also offers different metrics from the experiment to evaluate the quality of the final absolute phase. In contrast with other removal methods, experimental results have verified the feasibility, effectiveness, and superiority of the proposed method. (C) 2016 Optical Society of America
机译:提出了一种新的方法,以便在绝对相位恢复中更有效地去除无效的相位值。该方法基于涉及无效相位值的类型和情况的详细研究。同时,彻底分析了现有的去除算法的一些共性。众所周知,通过时间相位展开技术可以非常容易地获得粗糙的绝对相和条纹级映射。在仔细分析粗糙条纹序列地图的组件和条纹订单分布后,所提出的方法主要采用全新的新策略来改进纯净的条纹级映射。该策略由三部分组成:(1)图像梯度的正方形,(2)二进制图像的子区域区域,(3)图像分解和组成。结合纯条纹订单映射和去除标准,可以从粗略的绝对相位映射识别和滤除无效的相位值。这种新策略不仅摆脱了传统清除方法的局限性,而且还具有两倍的功能。本文还提供了从实验中提供不同的指标,以评估最终绝对阶段的质量。与其他去除方法相比,实验结果验证了所提出的方法的可行性,有效性和优越性。 (c)2016年美国光学学会

著录项

  • 来源
    《Applied optics》 |2016年第2期|共8页
  • 作者单位

    Northwestern Polytech Univ Key Lab Contemporary Design &

    Integrated Mfg Tech Educ Minist Xian 710072 Shaanxi Peoples R China;

    Northwestern Polytech Univ Key Lab Contemporary Design &

    Integrated Mfg Tech Educ Minist Xian 710072 Shaanxi Peoples R China;

    Northwestern Polytech Univ Key Lab Contemporary Design &

    Integrated Mfg Tech Educ Minist Xian 710072 Shaanxi Peoples R China;

    Northwestern Polytech Univ Key Lab Contemporary Design &

    Integrated Mfg Tech Educ Minist Xian 710072 Shaanxi Peoples R China;

    Northwestern Polytech Univ Key Lab Contemporary Design &

    Integrated Mfg Tech Educ Minist Xian 710072 Shaanxi Peoples R China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 应用;
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