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首页> 外文期刊>Applied optics >Improving carrier transport in AlGaN deep-ultraviolet light-emitting diodes using a strip-in-a-barrier structure
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Improving carrier transport in AlGaN deep-ultraviolet light-emitting diodes using a strip-in-a-barrier structure

机译:使用条带内屏障结构改善AlGaN深紫外发光二极管中的载流子

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摘要

This paper reports the illustration of electron blocking layer (EBL)-free AlGaN light-emitting diodes (LEDs) operating in the deep-ultraviolet (DUV) wavelength at similar to 270 nm. In this work, we demonstrated that the integration of an optimized thin undoped AlGaN strip layer in the middle of the last quantum barrier (LQB) could generate enough conduction band barrier height for the effectively reduced electron overflow into the p-GaN region. Moreover, the hole injection into the multi-quantum-well active region is significantly increased due to a large hole accumulation at the interface of the AlGaN strip and the LQB. As a result, the internal quantum efficiency and output power of the proposed LED structure has been enhanced tremendously compared to that of the conventional p-type EBL-based LED structure. (C) 2020 Optical Society of America
机译:本文报道了在类似于270nm的深紫外(DUV)波长中操作的电子阻挡层(EBL)的插图 - 从深紫外(DUV)波长。 在这项工作中,我们证明了在最后一量子屏障(LQB)的中间的优化薄未掺杂的AlGaN条层的集成可以产生足够的导电带阻挡高度,以便有效地减少到P-GaN区域中。 此外,由于AlGaN条带的界面和LQB的界面处的大空穴积累,该空穴注入到多量子阱有源区。 结果,与传统的P型EBL的LED结构相比,所提出的LED结构的内部量子效率和输出功率已经提高。 (c)2020美国光学学会

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  • 来源
    《Applied optics》 |2020年第17期|共6页
  • 作者单位

    New Jersey Inst Technol Dept Elect &

    Comp Engn 323 Dr Martin Luther King Jr Blvd Newark NJ 07102 USA;

    New Jersey Inst Technol Dept Elect &

    Comp Engn 323 Dr Martin Luther King Jr Blvd Newark NJ 07102 USA;

    New Jersey Inst Technol Dept Elect &

    Comp Engn 323 Dr Martin Luther King Jr Blvd Newark NJ 07102 USA;

    New Jersey Inst Technol Dept Elect &

    Comp Engn 323 Dr Martin Luther King Jr Blvd Newark NJ 07102 USA;

    New Jersey Inst Technol Dept Elect &

    Comp Engn 323 Dr Martin Luther King Jr Blvd Newark NJ 07102 USA;

    New Jersey Inst Technol Dept Elect &

    Comp Engn 323 Dr Martin Luther King Jr Blvd Newark NJ 07102 USA;

    Vietnam Acad Sci &

    Technol Inst Chem Technol Ho Chi Minh City 700000 Vietnam;

    Natl Inst Technol Silchar Dept Elect &

    Commun Engn Silchar 788010 Assam India;

    New Jersey Inst Technol Dept Elect &

    Comp Engn 323 Dr Martin Luther King Jr Blvd Newark NJ 07102 USA;

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  • 正文语种 eng
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