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Dual subaperture stitching for large flat mirror testing

机译:用于大型平面镜测试的双子镜缝合

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摘要

The Ritchey-Common test is a widely used method for testing flat mirrors with a larger reference spherical mirror. However, with the increase in the size of the flat mirror, the fabrication of the spherical mirror becomes more time consuming and expensive. In this study, we developed a novel technique to test a large flat mirror with a smaller reference sphere using a dual subaperture stitching (DSS) method. One part of the DSS technique is a modified Ritchey-Common test, which uses a reference sphere smaller than the flat mirror. The other part involves scanning along the centerline of the flat mirror. The former can be used to determine the surface form error (SFE), except for rotationally symmetric components, such as power and spherical aberrations, which can be measured by the latter. To perform the stitching process using a smaller reference sphere, the flat mirror was repeatedly rotated by a fixed angular step. One of the advantages of the rotation of the flat mirror is that it can be used to identify the errors resulting from the reference sphere, which do not vary during the rotation of the flat mirror. We verified the DSS method using a 152 mm diameter optical flat mirror and determined the root-mean-square (rms) measurement error to be only 0.2 nm, which was comparable to the error of the full-aperture interferometric measurement. In addition, we tested a 1.2 m diameter flat mirror with a reference sphere with an aperture of 0.8 m and measured its SFE to be 11.9 +/- 0.5 nm rms. (C) 2020 Optical Society of America
机译:Ritchey-Common Rest是一种广泛使用的方法,用于使用较大的参考球镜测试平面镜。然而,随着扁平镜的尺寸的增加,球面镜的制造变得更加耗时和昂贵。在这项研究中,我们开发了一种新颖的技术,用于使用双子射线拼接(DSS)方法用较小的参考球测试大型扁平镜。 DSS技术的一部分是改进的Ritchey-Common测试,其使用小于平面镜的参考球。另一部分涉及沿着平面镜的中心线扫描。前者可用于确定表面形式误差(SFE),除了旋转对称的组件,例如功率和球面像差,其可以通过后者测量。为了使用较小的参考球执行缝合过程,通过固定的角度步骤重复旋转平面镜。扁平镜的旋转的优点之一是它可用于识别由参考球导致的误差,该误差在平面镜的旋转期间不会变化。我们使用152 mm直径的光学平面镜验证了DSS方法,并确定了根均方(RMS)测量误差仅为0.2nm,其与全孔径干涉测量的误差相当。另外,我们用孔径为1.2米直径的平面镜,孔径为0.8米,并测量其SFE为11.9 +/- 0.5nm rms。 (c)2020美国光学学会

著录项

  • 来源
    《Applied optics》 |2020年第28期|共7页
  • 作者单位

    Univ Sci &

    Technol 217 Gajeong Ro Daejeon 34113 South Korea;

    Korea Res Inst Stand &

    Sci Space Opt Team Adv Instrumentat Inst 267 Gajeong Ro Daejeon 34113 South Korea;

    Korea Astron &

    Space Sci Inst Technol Ctr Astron &

    Space Sci 776 Daedeok Daero Daejeon 34055 South Korea;

    Univ Sci &

    Technol 217 Gajeong Ro Daejeon 34113 South Korea;

    Univ Sci &

    Technol 217 Gajeong Ro Daejeon 34113 South Korea;

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  • 正文语种 eng
  • 中图分类 应用;
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