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首页> 外文期刊>ACS nano >Current saturation in field emission from H-passivated Si nanowires
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Current saturation in field emission from H-passivated Si nanowires

机译:H钝化的Si纳米线在场发射中的电流饱和

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摘要

This paper explores the field emission (FE) properties of highly crystalline Si nanowires (NWs) with controlled surface passivation. The NWs were batch-grown by the vapor-liquid-solid process using Au catalysts with no intentional doping. The FE current-voltage characteristics showed quasi-ideal current saturation that resembles those predicted by the basic theory for emission from semiconductors, even at room temperature. In the saturation region, the currents were extremely sensitive to temperature and also increased linearly with voltage drop along the nanowire. The latter permits the estimation of the doping concentration and the carrier lifetime, which is limited by surface recombination. The conductivity could be tuned over 2 orders of magnitude by in situ hydrogen passivation/desorption cycles. This work highlights the role of dangling bonds in surface leakage currents and demonstrates the use of hydrogen passivation for optimizing the FE characteristics of Si NWs.
机译:本文探讨了具有受控表面钝化作用的高结晶硅纳米线(NWs)的场发射(FE)特性。通过使用Au催化剂的汽-液-固过程分批生长NW,无意掺杂。 FE电流-电压特性显示出准理想的电流饱和度,该饱和度类似于在室温下半导体发射的基本理论所预测的饱和度。在饱和区域,电流对温度极其敏感,并且随着沿着纳米线的电压下降而线性增加。后者允许估计掺杂浓度和载流子寿命,这受表面复合的限制。通过原位氢钝化/解吸循环,可以将电导率调整到2个数量级以上。这项工作突出了悬空键在表面泄漏电流中的作用,并证明了使用氢钝化来优化Si NWs的FE特性。

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