We have developed a soft-lithography method to replicate polymer waveguides. In this method, the waveguides are produced by a two-step molding process where a master mold is first formed on a negative-tone photoresist and subsequently transferred to a polydimethylsiloxane (PDMS) mold; a PDMS silicone rubber mold is then used as a stamp to transfer the final waveguide pattern onto an UV cure epoxy. Initial results show good pattern transferring in physical shape. The optical performance is measured based on the propagation loss. In our design, the loss was measured at 0.28 dB/cm for 1.3 (mu)m and 0.26 dB/cm for 1.55 (mu)m.
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机译：我们已经开发出一种软光刻方法来复制聚合物波导。在这种方法中，波导是通过两步成型工艺生产的，其中首先在负性光刻胶上形成母模，然后将其转移到聚二甲基硅氧烷（PDMS）模子中;然后将PDMS硅橡胶模具用作压模，以将最终的波导图案转移到UV固化环氧树脂上。初步结果表明，良好的图案在物理形状上转移。基于传播损耗来测量光学性能。在我们的设计中，对于1.3μm的损耗测量为0.28 dB / cm，对于1.55μm的损耗测量为0.26 dB / cm。
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