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首页> 外文期刊>Applied optics >Replication of a holographic ion-etched spherical blazed grating for use at extreme-ultraviolet wavelengths: efficiency
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Replication of a holographic ion-etched spherical blazed grating for use at extreme-ultraviolet wavelengths: efficiency

机译:复制用于极端紫外线波长的全息离子蚀刻球形火焰光栅:效率

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摘要

Using synchrotron radiation, we have measured the efficiency at an angle of incidence of 10 deg of a holographic ion-etched spherical blazed grating and three of its fourth-generation replicas. The measured efficiency profile of replicas 1 and 3 prior to multilayer coating oscillated from thin-film interference produced by the replicas' Al/Al_(2)O_(3)/SiO_(2) structure. A Mo_(2)C/Si multilayer coating was applied to the master grating and replicas 1 and 2. After coating, the maximum grating efficiency occurred in the -2nd order and the maximum values were 12.4percent at 143.8 A for the master and 11.6percent at 145.2 A for replicas 1 and 2. On the basis of measurements obtained after coating, the derived groove efficiency was 22.2percent for the master, 19.4percent for replica 1, and 19.3percent for replica 2. The groove efficiency of the uncoated replica 3 was 24.3percent at 142.5 A. We find that the replicas are reasonably faithful copies of the ion-etched master, and models based on measured atomic force microscope groove profiles are in general agreement with measured results. However, subtle issues remain regarding the widths of the peak order profile and the location of its maximum wavelength.
机译:使用同步加速器辐射,我们已经测量了全息离子蚀刻球形闪耀光栅及其三个第四代复制品在入射角为10度时的效率。复制品1和3的测量效率曲线在多层涂层振荡之前受到复制品的Al / Al_(2)O_(3)/ SiO_(2)结构产生的薄膜干扰的影响。将Mo_(2)C / Si多层涂层应用于母版光栅以及复制品1和2。涂布后,最大光栅效率以-2阶发生,在143.8 A时母版和11.6的最大值为12.4%。对于复制品1和2,在145.2 A时的百分比百分比。根据涂布后获得的测量结果,对于母版,得出的凹槽效率为22.2%,对于复制品1为19.4%,对于复制品2为19.3%。未经涂层的复制品的凹槽效率3在142.5 A时为24.3%。我们发现这些复制品是离子蚀刻母版的合理忠实副本,并且基于测得的原子力显微镜凹槽轮廓的模型与测量结果基本一致。但是,关于峰阶分布的宽度及其最大波长的位置,仍然存在一些细微的问题。

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