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Interface characterisation of ZnSe/CuGaSe_2 heterojunction

机译:ZnSe / CuGaSe_2异质结的界面表征

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The ZnSe/CuGaSe_2 heteojunctions were fabricated by flash evaporation technique of CuGaSe_2 onto the (110) surface of ZnSe crystals. CuGaSe_2 layers had thickness ~2-4 μm and showed a hole concentration up to (1.5-18.0)×10~18 cm~-3 and mobility μ~4-24 cm~2V~-1s~-1 at 300 K. The charge carrier concentration in ZnSe crystals at 300 K was n=5.6×10~16 cm~-3 and their mobility μ=300 cm~2V~-1s~-1. The investigated ZnSe/CuGaSe_2 heterojunctions have at the interface an intermediate layer with a thickness of ~450-750 A and a linear graded band gap as well as an i-ZnSe compensated layer with a thickness of ~1-2 μm and resistivity ρ~10~8-10~9 Ω cm.
机译:ZnSe / CuGaSe_2异质结通过闪蒸技术在CuSe的(110)表面上制备。 CuGaSe_2层的厚度约为2-4μm,在300 K时的空穴浓度高达(1.5-18.0)×10〜18 cm〜-3,迁移率μ〜4-24 cm〜2V〜-1s〜-1。 ZnSe晶体在300 K时的载流子浓度为n = 5.6×10〜16 cm〜-3,迁移率μ= 300 cm〜2V〜-1s〜-1。所研究的ZnSe / CuGaSe_2异质结在界面处具有厚度约为450-750 A和线性梯度带隙的中间层,以及厚度约为1-2μm和电阻率ρ〜的i-ZnSe补偿层。 10〜8-10〜9Ω厘米

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