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Pulse Plated Cds_(xtel-x) Films And Their Properties

机译:脉冲镀Cds_(xtel-x)薄膜及其性能

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CdS_xTe_(1-x) films were deposited on titanium and conducting glass substrates at room temperature using 0.25 M cadmium sulphate, the concentration of sodium thiosulphate and TeO_2 dissolved in sodium hydroxide was varied in the range of 0.01-0.05 M. The as deposited films exhibited hexagonal structure irrespective of the composition. The FWHM maximum of the x-ray diffraction peaks were found to decrease with increase of duty cycle. The optical energy gap values are in the range of 1.54-2.32 eV for films of different composition, it is observed that the band gap shifts towards CdS side as the concentration of CdS in the films increase. XPS studies indicated the formation of CdSTe solid solution. The grain size increases from 11.54 to 99.40 nm as the value of .v increases from 0.2 to 0.8. The surface roughness is found to increase from 0.22 to 2.50 nm as the value of 'x' increases from 0.2 to 0.8. The resistivity is found to vary from 53 to 8 ohm cm as the 'x' value decreases from 1 to 0.
机译:在室温下使用0.25 M的硫酸镉将CdS_xTe_(1-x)膜沉积在钛和导电玻璃基板上,硫代硫酸钠和TeO_2溶解在氢氧化钠中的浓度在0.01-0.05 M的范围内变化。不论组成如何,均表现出六方结构。发现X射线衍射峰的FWHM最大值随着占空比的增加而降低。对于不同组成的膜,光能隙值在1.54-2.32eV的范围内,观察到随着膜中CdS的浓度增加,带隙向CdS侧移动。 XPS研究表明形成了CdSTe固溶体。当.v值从0.2增加到0.8时,晶粒尺寸从11.54nm增加到99.40nm。随着“ x”的值从0.2增加到0.8,发现表面粗糙度从0.22增加到2.50nm。随着'x'值从1降低到0,发现电阻率在53到8 ohm cm之间变化。

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