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Electrodeposited tin selenide thin films for photovoltaic applications

机译:用于光伏应用的电沉积硒化锡薄膜

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摘要

Tin selenide thin films of about 300 nm thickness were electrodeposited on SnO_2:F coated transparent conductive oxide glass substrates. The optimum deposition potential was determined from cyclic voltammetry measurements. The films were polycrystalline with orthorhombic structure and the grain size was about 18 nm. SEM images showed a highly porous film structure. The band gap estimated from optical spectra of these films showed absorption due to direct transition occurring at 1.1 eV. Characteristic vibrational modes of the SnSe were observed in the Raman spectrum. The films are p-type, photosensitive, and the conductivity measured in dark was in the range of 10~(-5) Ω~(-1) cm~(-1). A prototype CdS/SnSe photovoltaic device showed an open circuit voltage of 140 mV and short circuit current density 0.7 mA/cm~2.
机译:在SnO_2:F涂层的透明导电氧化物玻璃基板上电沉积约300 nm厚的硒化锡薄膜。根据循环伏安法测量确定最佳沉积电位。该膜是具有正交结构的多晶,并且晶粒尺寸为约18nm。 SEM图像显示出高度多孔的膜结构。从这些膜的光谱估计的带隙显示出吸收,这是由于在1.1 eV处发生了直接跃迁。在拉曼光谱中观察到SnSe的特征振动模式。该膜是p型,光敏的,在黑暗中测得的电导率在10〜(-5)Ω〜(-1)cm〜(-1)的范围内。原型CdS / SnSe光伏器件的开路电压为140 mV,短路电流密度为0.7 mA / cm〜2。

著录项

  • 来源
    《Solar Energy》 |2012年第4期|p.1010-1016|共7页
  • 作者

    N.R. Mathews;

  • 作者单位

    Centra de Investigation en Energia, Universidad National Autonoma de Mexico, Temixeo, Morclos 62580, Mexico;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    SnSe; SnSe/CdS; electrodeposition; raman spectra;

    机译:SnSe;SnSe / CdS;电沉积拉曼光谱;

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