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首页> 外文期刊>Solar Energy >Angle-dependent ray tracing simulations of reflections on pyramidal textures for silicon solar cells
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Angle-dependent ray tracing simulations of reflections on pyramidal textures for silicon solar cells

机译:硅太阳能电池金字塔纹理反射的角度依赖射线跟踪模拟

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摘要

Pyramidal textures are commonly used to reduce reflections from silicon solar cells and improve light absorption by light trapping. They are generally modelled or characterised under normal incidence. In this work, a monolayer 3D ray tracing program taking into account the polarisation of light have been developed, validated and used to compute the directional-hemispherical reflectance versus the azimuth and incidence angles for both regular upright pyramids and inverted ones, with (1 1 1) facets. Results are given for a wavelength of 0.7 mu m. They show that this reflectance is not minimal at normal incidence but for an incidence angle near 20 degrees and that upright pyramids can have a lower hemispherical reflectance than inverted ones for incidence angles in the middle range. The bihemispherical reflectance is 19.6% for regular upright pyramids and 20.7% for inverted ones. The effect of the pyramids aspect ratio on the hemispherical reflectance at normal incidence is also studied. This reflectance decreases with the aspect ratio of both textures. Above an aspect ratio of 0.51, inverted pyramids have a lower hemispherical reflectance. But their bihemispherical reflectance is lower only for aspect ratios below 0.23. (C) 2014 Elsevier Ltd. All rights reserved.
机译:金字塔形纹理通常用于减少来自硅太阳能电池的反射并通过光陷阱改善光吸收。通常在正常发病率下对它们进行建模或表征。在这项工作中,已经开发,验证并考虑了光偏振的单层3D射线追踪程序,用于计算定向直角金字塔和倒置金字塔的定向半球反射率与方位角和入射角的关系,其中(1 1 1)方面。给出了波长为0.7微米的结果。他们表明,在法向入射时,该反射率不是最小的,但是对于接近20度的入射角,对于中程入射角,直立金字塔的半球反射率比倒置金字塔低。常规直立金字塔的双半球反射率为19.6%,而倒置金字塔的双半球反射率为20.7%。还研究了金字塔长宽比对法向入射时半球反射率的影响。该反射率随着两种纹理的纵横比而降低。纵横比大于0.51时,倒金字塔的半球反射率较低。但是,仅当纵横比低于0.23时,它们的双半球反射率才较低。 (C)2014 Elsevier Ltd.保留所有权利。

著录项

  • 来源
    《Solar Energy》 |2014年第12期|378-385|共8页
  • 作者单位

    Univ Lille 1 Sci & Technol, CNRS, Inst Elect Microglect & Nanotechnol, UMR 8520, F-59652 Villeneuve Dascq, France;

    Univ Lille 1 Sci & Technol, CNRS, Inst Elect Microglect & Nanotechnol, UMR 8520, F-59652 Villeneuve Dascq, France;

    Univ Lille 1 Sci & Technol, CNRS, Inst Elect Microglect & Nanotechnol, UMR 8520, F-59652 Villeneuve Dascq, France;

    CNRS, Inst Chim & Mat Paris Est, UMR 7182, F-94320 Thiais, France;

    Univ Lille 1 Sci & Technol, CNRS, Inst Elect Microglect & Nanotechnol, UMR 8520, F-59652 Villeneuve Dascq, France;

    Univ Lille 1 Sci & Technol, CNRS, Inst Elect Microglect & Nanotechnol, UMR 8520, F-59652 Villeneuve Dascq, France;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Texture; Ray tracing; Reflectance; Solar cell;

    机译:纹理;光线追踪;反射率;太阳能电池;

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