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首页> 外文期刊>Solar Energy >Facile preparation of micron- and nano-scale textured master for nano-imprinting front electrode in thin-film silicon tandem cells with improved light trapping
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Facile preparation of micron- and nano-scale textured master for nano-imprinting front electrode in thin-film silicon tandem cells with improved light trapping

机译:利用改进的光阱,轻松制备用于纳米级压印薄膜硅串联电池中前电极的微米级和纳米级纹理母版

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摘要

This paper reports a facile method to prepare a textured surface with combined micron- and nano-scale surface features, which is used as master for nano-imprinting process to obtain transparent front electrodes in thin-film silicon tandem cells. The micron- and nano-scale surface features of the master are formed by combination of SiO2 sphere pre-deposition and ZnO textured growth. The master exhibits an averaged total transmittance value of 89.7% and an averaged haze value of 54.1% for the wavelength from 380 to 1100 urn. Comparing to the flat reference cell, the thin-film Si tandem cell deposited on the superstrate prepared using this master shows substantial decrease in reflectance at long wavelengths and drastic gain in the photocurrent of the bottom cell, the maximum summed current is enhanced by 35.5%, and the convert efficiency is improved from 8% to 10.0 +/- 0.3%. (C) 2015 Elsevier Ltd. All rights reserved.
机译:本文报道了一种简便的方法来制备具有微米级和纳米级表面特征的带纹理的表面,该方法可用作纳米压印工艺的母版以获得薄膜硅串联电池中的透明前电极。母版的微米级和纳米级表面特征是由SiO2球预沉积和ZnO织构化生长共同形成的。对于波长为380至1100 um的波长,母版的平均总透射率值为89.7%,平均雾度值为54.1%。与平面参考电池相比,使用该原版制备的沉积在上基板上的薄膜硅串联电池在长波长下反射率显着降低,底部电池的光电流急剧增加,最大总电流增加了35.5%。 ,转换效率从8%提高到10.0 +/- 0.3%。 (C)2015 Elsevier Ltd.保留所有权利。

著录项

  • 来源
    《Solar Energy》 |2015年第5期|518-524|共7页
  • 作者单位

    Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China;

    Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China;

    Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China;

    Ecole Polytech Fed Lausanne, Inst Microengn IMT, Photovolta & Thin Film Elect Lab, Neuchatel, Switzerland;

    Ecole Polytech Fed Lausanne, Inst Microengn IMT, Photovolta & Thin Film Elect Lab, Neuchatel, Switzerland;

    Ecole Polytech Fed Lausanne, Inst Microengn IMT, Photovolta & Thin Film Elect Lab, Neuchatel, Switzerland;

    Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Nano-imprinting; Master; Front electrode; Light trapping;

    机译:纳米压印;母版;前电极;陷光;

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