...
首页> 外文期刊>Solar Energy >Cu(In,Ga)S-2 absorber layer prepared for thin film solar cell by electrodeposition of Cu-Ga precursor from deep eutectic solvent
【24h】

Cu(In,Ga)S-2 absorber layer prepared for thin film solar cell by electrodeposition of Cu-Ga precursor from deep eutectic solvent

机译:通过从深共熔溶剂中电沉积Cu-Ga前驱体制备用于薄膜太阳能电池的Cu(In,Ga)S-2吸收层

获取原文
获取原文并翻译 | 示例
           

摘要

Cu(ln,Ga)S-2 (CIGS) solar energy thin film is fabricated with the one-step electrodeposition of Cu-Ga precursors on indium tin oxide (ITO) substrate from deep eutectic solvent to eliminate the interference of hydrogen evolution reaction (HER) followed by thermal annealing treatment to incorporate In, diffused from the ITO substrate. Pure quaternary chalcopyrite CIGS phase in good polycrystalline structure without secondary phase is obtained after annealing. The influence of deposition potential on the crystalline phase, morphology, composition and carrier concentration of the films are investigated. A relative negative shift of deposition potential results in the increasement of Ga content and the decrease of In and Cu content in quaternary CIGS structure. The Cu/(Ga + In) ratio decreases with the deposition potential benefiting the formation of a pure crystallized CIGS thin film. A relative positive deposition potential results in a lower Ga/(Ga + In) ratio and a lager crystal size. The thickness of CIGS films tends to increase slightly with negative shift of deposited potential. The thickness of film deposited at -1.1 V is about 2 mu m which is in the range of the optimum thickness of CIGS thin film solar cell. Impedance spectroscopy test demonstrates the semiconductor property of the synthesized CIGS polycrystalline thin films are p-type. The flat band potential and the carrier concentration of obtained CIGS thin films increase with negative shift of deposition potential. (C) 2016 Elsevier Ltd. All rights reserved.
机译:铜(In,Ga)S-2(CIGS)太阳能薄膜是通过从深共熔溶剂中一步法在铟锡氧化物(ITO)衬底上电沉积Cu-Ga前驱体来制造的,以消除氢释放反应的干扰( HER),然后进行热退火处理以掺入从ITO基板扩散的In。退火后,得到具有良好多晶结构而没有第二相的纯季金黄铜矿CIGS相。研究了沉积电势对薄膜的晶相,形态,组成和载流子浓度的影响。沉积电位的相对负迁移会导致四元CIGS结构中Ga含量增加,In和Cu含量减少。 Cu /(Ga + In)比随着沉积电位而降低,有利于形成纯结晶CIGS薄膜。相对正的沉积电位导致较低的Ga /(Ga + In)比和较大的晶体尺寸。随着沉积电位的负移,CIGS膜的厚度趋于稍微增加。在-1.1V下沉积的膜的厚度为约2μm,这在CIGS薄膜太阳能电池的最佳厚度的范围内。阻抗谱测试表明,合成的CIGS多晶薄膜的半导体性质为p型。所获得的CIGS薄膜的平带电势和载流子浓度随着沉积电势的负移而增加。 (C)2016 Elsevier Ltd.保留所有权利。

著录项

  • 来源
    《Solar Energy》 |2016年第1期|29-35|共7页
  • 作者单位

    Xiangtan Univ, Hunan Key Lab Micronano Energy Mat & Devices, Xiangtan 411105, Hunan, Peoples R China|Xiangtan Univ, Lab Quantum Engn & Micronano Energy Technol, Xiangtan 411105, Hunan, Peoples R China|Xiangtan Univ, Sch Phys & Optoelect, Xiangtan 411105, Hunan, Peoples R China;

    Xiangtan Univ, Hunan Key Lab Micronano Energy Mat & Devices, Xiangtan 411105, Hunan, Peoples R China|Xiangtan Univ, Lab Quantum Engn & Micronano Energy Technol, Xiangtan 411105, Hunan, Peoples R China|Xiangtan Univ, Sch Phys & Optoelect, Xiangtan 411105, Hunan, Peoples R China;

    Xiangtan Univ, Coll Chem, Xiangtan 411105, Hunan, Peoples R China;

    Xiangtan Univ, Coll Chem, Xiangtan 411105, Hunan, Peoples R China;

    Xiangtan Univ, Hunan Key Lab Micronano Energy Mat & Devices, Xiangtan 411105, Hunan, Peoples R China|Xiangtan Univ, Lab Quantum Engn & Micronano Energy Technol, Xiangtan 411105, Hunan, Peoples R China|Xiangtan Univ, Sch Phys & Optoelect, Xiangtan 411105, Hunan, Peoples R China;

    Xiangtan Univ, Coll Chem, Xiangtan 411105, Hunan, Peoples R China;

    Xiangtan Univ, Hunan Key Lab Micronano Energy Mat & Devices, Xiangtan 411105, Hunan, Peoples R China|Xiangtan Univ, Lab Quantum Engn & Micronano Energy Technol, Xiangtan 411105, Hunan, Peoples R China|Xiangtan Univ, Sch Phys & Optoelect, Xiangtan 411105, Hunan, Peoples R China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Electrochemical deposition; Deep eutectic solvent; Cu(ln,Ga)S-2 thin film; Solar cell;

    机译:电化学沉积;深共熔溶剂;Cu(In;Ga)S-2薄膜;太阳能电池;

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号