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首页> 外文期刊>Solar Energy >Growth of antimony selenide solar absorber on micro textured substrates for efficient light trapping and enhanced optical absorption
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Growth of antimony selenide solar absorber on micro textured substrates for efficient light trapping and enhanced optical absorption

机译:微纹理基板上锑硒的生长,用于高效光捕获和增强光学吸收

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摘要

We propose a method for substrate surface texturing with shallow micro structures (such as cylinders) made up of cross-linked SU8 2005 photoresist on glass substrates for conformal growth of thin films of functional materials. In this work, the textured substrates were used for the growth of antimony selenide (Sb2Se3) solar absorber and its properties were studied in comparison with films on plain glass substrates. Cross-linked SU8 2005 structures, i.e., an array of equally spaced cylinders having the dimensions of 100 mu m/70 mu m/40 mu m diameter and 5 mu m height, were introduced over an area of 20 mm x 20 mm on glass substrates via optical lithography process. Thin films of Sb2Se3 were grown above the textured surface using e-beam evaporation covering the glass-like resist structures underneath. Optical microscopy, scanning electron microscope (SEM) and optical profiler analyses confirm the morphological integrity of the Sb2Se3 absorber layer grown on textured substrates. Raman spectra were collected on plain and textured samples to probe the structural uniformity. The optical absorbance data of Sb2Se3 thin films grown on plain and periodically textured glass substrates were investigated using UV-Vis-NIR spectroscopy to study the effects of substrate texturing.
机译:我们提出了一种用浅微结构(例如圆柱体)的基板表面纹理化的方法,由玻璃基板上的交联的SU8 2005光致抗蚀剂组成,用于保形功能材料的薄膜的共形薄膜的生长。在这项工作中,纹理的基材用于硒化锑(SB2Se3)的生长(SB2Se3)太阳能吸收器及其性质与普通玻璃基板上的薄膜进行了研究。交联的SU8 2005结构,即,具有100μm/70μm/40μm/40μm的尺寸和5μm高度的等间隔开的圆柱体阵列被引入玻璃上的20mm×20mm的面积。通过光学光刻工艺基板。使用覆盖下方的玻璃状抗蚀剂结构的电子束蒸发,Sb2se3的薄膜在纹理表面上方生长。光学显微镜,扫描电子显微镜(SEM)和光学分析器分析确认了在纹理的基材上生长的SB2Se3吸收层的形态完整性。在普通和纹理样品上收集拉曼光谱以探测结构均匀性。使用UV-Vis-Nir光谱研究在平滑和周期性纹理玻璃基板上生长的Sb2Se3薄膜的光学吸光度数据,以研究衬底纹理的影响。

著录项

  • 来源
    《Solar Energy》 |2020年第2期|977-987|共11页
  • 作者单位

    SRM Inst Sci & Technol SRM Res Inst Dept Phys & Nanotechnol Kattankulathur 603203 Tamil Nadu India;

    SRM Inst Sci & Technol SRM Res Inst Dept Phys & Nanotechnol Kattankulathur 603203 Tamil Nadu India;

    SRM Inst Sci & Technol SRM Res Inst Dept Phys & Nanotechnol Kattankulathur 603203 Tamil Nadu India|Catalonia Inst Energy Res IREC Barcelona 08930 Spain;

    Indian Inst Technol Madras Nano Funct Mat Technol Ctr Dept Phys Chennai 600036 Tamil Nadu India|Indian Inst Technol Madras Mat Sci Res Ctr Chennai 600036 Tamil Nadu India;

    Indian Inst Technol Madras Nano Funct Mat Technol Ctr Dept Phys Chennai 600036 Tamil Nadu India|Indian Inst Technol Madras Mat Sci Res Ctr Chennai 600036 Tamil Nadu India;

    SRM Inst Sci & Technol SRM Res Inst Dept Phys & Nanotechnol Kattankulathur 603203 Tamil Nadu India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Optical lithography; Periodic patterning; Sb2Se3 thin films; Absorbance;

    机译:光学光刻;定期图案化;SB2SE3薄膜;吸光度;

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