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首页> 外文期刊>Solar Energy >Enhanced performance of CH_3NH_3PbI_3-based perovskite solar cells by tuning the electrical and structural properties of mesoporous TiO_2 layer via Al and Mg doping
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Enhanced performance of CH_3NH_3PbI_3-based perovskite solar cells by tuning the electrical and structural properties of mesoporous TiO_2 layer via Al and Mg doping

机译:通过铝和镁的掺杂来调节介孔TiO_2层的电学和结构性能,从而提高基于CH_3NH_3PbI_3的钙钛矿型太阳能电池的性能

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摘要

In this work, we investigate how Al and Mg doped mesoporous TiO2 layers can improve the power conversion efficiency (PCE) of perovskite solar cells (PSCs) with respect to undoped mesoporous TiO2, The PSC configuration used in this study consists of mesoscopic structure with CH3NH3PbI3 as the perovskite absorber. A PSC with optimized mol% of Al and Mg doped mesoporous TiO2 layers has been shown to achieve up to 22% higher efficiency than that of pure TiO2. While the Mg doping only enhances the open-circuit voltage (V-OC), the Al doping effectively enhances the V-OC, the short-circuit current density (J(SC)), and the fill factor (FF). The occupancy of the doped metals in the lattice is confirmed by XRD, EDX, and XPS. The Mg doping increases the band gap of TiO2 while the Al doping decreases it. The wide band gap in Mg doped TiO2 reduces the electron and hole recombination rate, thus increasing the J(SC) and V-OC. By Al doping, deep trap sites in the TiO2 are eliminated, and this effectively reduces the recombination losses and in turn, increases the J(SC). The enhanced electron-hole generation rate attributed to the decrease in the band gap of Al doped TiO2 also increases the J(SC). In addition, there is an enhancement on the electron mobility by the presence of Al metal and this gives an increase in the FF. The results have demonstrated the possibility of improving the PCE of PSCs by fine tuning the band gap of mesoporous TiO2.
机译:在这项工作中,我们研究了Al和Mg掺杂的介孔TiO2层如何相对于未掺杂的介孔TiO2可以提高钙钛矿太阳能电池(PSC)的功率转换效率(PCE)。本研究中使用的PSC构型由具有CH3NH3PbI3的介观结构组成作为钙钛矿吸收剂。已经证明,具有优化的mol%的Al和Mg掺杂的中孔TiO2层的PSC可以获得比纯TiO2最高高22%的效率。 Mg掺杂只会提高开路电压(V-OC),而Al掺杂则会有效提高V-OC,短路电流密度(J(SC))和填充系数(FF)。 XRD,EDX和XPS证实了晶格中掺杂金属的占有率。 Mg掺杂会增加TiO2的带隙,而Al掺杂会减少它的带隙。 Mg掺杂的TiO2中的宽带隙降低了电子和空穴的复合率,从而提高了J(SC)和V-OC。通过Al掺杂,可以消除TiO2中的深陷阱位,这有效地降低了复合损失,进而增加了J(SC)。 Al掺杂的TiO 2的带隙减小导致的提高的电子空穴产生速率也提高了J(SC)。另外,由于铝金属的存在,电子迁移率增加,这使FF增加。结果表明,通过微调介孔TiO2的带隙可以改善PSC的PCE。

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