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All-printed thin-film transistors from networks of liquid-exfoliated nanosheets

机译:液体剥落纳米片网络的全印刷薄膜晶体管

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摘要

All-printed transistors consisting of interconnected networks of various types of two-dimensional nanosheets are an important goal in nanoscience. Using electrolytic gating, we demonstrate all-printed, vertically stacked transistors with graphene source, drain, and gate electrodes, a transition metal dichalcogenide channel, and a boron nitride (BN) separator, all formed from nanosheet networks. The BN network contains an ionic liquid within its porous interior that allows electrolytic gating in a solid-like structure. Nanosheet network channels display on: off ratios of up to 600, transconductances exceeding 5 millisiemens, and mobilities of > 0.1 square centimeters per volt per second. Unusually, the on-currents scaled with network thickness and volumetric capacitance. In contrast to other devices with comparable mobility, large capacitances, while hindering switching speeds, allow these devices to carry higher currents at relatively low drive voltages.
机译:由各种类型的二维纳米片的互连网络组成的全印刷晶体管是纳米科学的重要目标。使用电解门控,我们展示了所有印刷的,垂直堆叠的晶体管,这些晶体管具有石墨烯源,漏极和栅电极,过渡金属二卤化物沟道和氮化硼(BN)隔离器,所有这些均由纳米片网络形成。 BN网络在其多孔内部包含离子液体,该离子液体允许以固体状结构进行电解浇铸。纳米片网络通道显示的导通率:截止率高达600,跨导超过5毫西门子,迁移率> 0.1平方厘米/伏/秒。通常,导通电流与网络厚度和体积电容成比例。与具有类似迁移率的其他设备相比,大电容虽然会阻碍开关速度,但允许这些设备在相对较低的驱动电压下承载更高的电流。

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  • 来源
    《Science》 |2017年第6333期|69-73|共5页
  • 作者单位

    Ctr Res Adapt Nanostruct & Nanodev CRAN, Sch Phys, Dublin 2, Ireland|Trin Coll Dublin, AMBER, Dublin 2, Ireland;

    Trin Coll Dublin, Sch Chem, CRANN & AMBER, Dublin 2, Ireland;

    Ctr Res Adapt Nanostruct & Nanodev CRAN, Sch Phys, Dublin 2, Ireland|Trin Coll Dublin, AMBER, Dublin 2, Ireland;

    Ctr Res Adapt Nanostruct & Nanodev CRAN, Sch Phys, Dublin 2, Ireland|Trin Coll Dublin, AMBER, Dublin 2, Ireland;

    Ctr Res Adapt Nanostruct & Nanodev CRAN, Sch Phys, Dublin 2, Ireland|Trin Coll Dublin, AMBER, Dublin 2, Ireland;

    Ctr Res Adapt Nanostruct & Nanodev CRAN, Sch Phys, Dublin 2, Ireland|Trin Coll Dublin, AMBER, Dublin 2, Ireland;

    Trin Coll Dublin, Sch Chem, CRANN & AMBER, Dublin 2, Ireland;

    Trin Coll Dublin, Sch Chem, CRANN & AMBER, Dublin 2, Ireland;

    Delft Univ Technol, Dept Chem Engn, NL-2629 HZ Delft, Netherlands;

    Delft Univ Technol, Dept Chem Engn, NL-2629 HZ Delft, Netherlands;

    Toyota Motor Europe, Mat Res & Dev, B-1930 Toyota, Belgium;

    Delft Univ Technol, Dept Chem Engn, NL-2629 HZ Delft, Netherlands;

    Trin Coll Dublin, Sch Chem, CRANN & AMBER, Dublin 2, Ireland|Univ Bundeswehr, Fac Elect Engn & Informat Techol, Inst Phys, EIT 2, Munich, Germany;

    Ctr Res Adapt Nanostruct & Nanodev CRAN, Sch Phys, Dublin 2, Ireland|Trin Coll Dublin, AMBER, Dublin 2, Ireland;

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