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Topological insulator laser: Theory

机译:拓扑绝缘体激光器:理论

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摘要

Topological insulators are phases of matter characterized by topological edge states that propagate in a unidirectional manner that is robust to imperfections and disorder. These attributes make topological insulator systems ideal candidates for enabling applications in quantum computation and spintronics. We propose a concept that exploits topological effects in a unique way: the topological insulator laser. These are lasers whose lasing mode exhibits topologically protected transport without magnetic fields. The underlying topological properties lead to a highly efficient laser, robust to defects and disorder, with single-mode lasing even at very high gain values. The topological insulator laser alters current understanding of the interplay between disorder and lasing, and at the same time opens exciting possibilities in topological physics, such as topologically protected transport in systems with gain. On the technological side, the topological insulator laser provides a route to arrays of semiconductor lasers that operate as one single-mode high-power laser coupled efficiently into an output port.
机译:拓扑绝缘体是指以拓扑边缘状态为特征的物质相,这些拓扑边缘状态以单向方式传播,对缺陷和无序性很强。这些属性使拓扑绝缘体系统成为实现量子计算和自旋电子学应用的理想候选者。我们提出了一种以独特方式利用拓扑效应的概念:拓扑绝缘体激光器。这些是激光器,其激射模式在没有磁场的情况下显示出受拓扑保护的传输。潜在的拓扑特性导致了高效的激光器,对缺陷和混乱具有鲁棒性,即使在非常高的增益值下也具有单模激光。拓扑绝缘体激光器改变了当前对无序与激射之间相互作用的理解,同时也为拓扑物理学带来了令人兴奋的可能性,例如在增益系统中进行拓扑保护的传输。在技​​术方面,拓扑绝缘体激光器提供了通往半导体激光器阵列的路径,这些半导体激光器作为有效耦合到输出端口的一个单模高功率激光器而工作。

著录项

  • 来源
    《Science》 |2018年第6381期|1230-1230|共1页
  • 作者单位

    Technion Israel Inst Technol, Phys Dept, IL-32000 Haifa, Israel;

    Technion Israel Inst Technol, Phys Dept, IL-32000 Haifa, Israel;

    Univ Penn, Dept Elect & Syst Engn, Philadelphia, PA 19104 USA;

    Penn State Univ, Dept Phys, University Pk, PA 16802 USA;

    Nanyang Technol Univ, Div Phys & Appl Phys, Singapore 637371, Singapore;

    Univ Cent Florida, Coll Opt & Photon, CREOL, Orlando, FL 32816 USA;

    Univ Cent Florida, Coll Opt & Photon, CREOL, Orlando, FL 32816 USA;

    Technion Israel Inst Technol, Phys Dept, IL-32000 Haifa, Israel;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);美国《化学文摘》(CA);
  • 原文格式 PDF
  • 正文语种 eng
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