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首页> 外文期刊>Photonics Journal, IEEE >Effect of Quantum Barrier Thickness in the Multiple-Quantum-Well Active Region of GaInN/GaN Light-Emitting Diodes
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Effect of Quantum Barrier Thickness in the Multiple-Quantum-Well Active Region of GaInN/GaN Light-Emitting Diodes

机译:GaInN / GaN发光二极管多量子阱有源区中量子势垒厚度的影响

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摘要

The dependence of the polarization-induced electric field in GaInN/GaN multiple-quantum-well light-emitting diodes (LEDs) on the GaN quantum barrier (QB) thickness is investigated. Electrostatic arguments and simulations predict that a thin QB thickness reduces the electric field in the quantum wells (QWs) and also improves the LED efficiency. We experimentally demonstrate that the QW electric field decreases with decreasing QB thickness. The lower electric field results in a better overlap of electron and hole wave functions and better carrier confinement in the QWs. A reduced efficiency droop and enhanced internal quantum efficiency is demonstrated for GaInN/GaN LEDs when the QB thickness is reduced from 24.5 to 9.1 nm.
机译:研究了GaInN / GaN多量子阱发光二极管(LED)中极化感应电场对GaN量子势垒(QB)厚度的依赖性。静电学说和仿真预测,薄的QB厚度可减少量子阱(QW)中的电场,并提高LED效率。我们实验证明,QW电场随着QB厚度的减小而减小。较低的电场导致QW中电子和空穴波功能的重叠更好,并且载流子限制更好。当QB厚度从24.5 nm减小到9.1 nm时,GaInN / GaN LED的效率下降和内部量子效率提高。

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  • 来源
    《Photonics Journal, IEEE》 |2013年第4期|1600207-1600207|共1页
  • 作者单位

    $^{1}$ Future Chips Constellation, Department of Electrical, Computer, and Systems, Engineering, Rensselaer Polytechnic Institute, Troy, NY , USA;

    $^{2}$ Department of Materials Science and Engineering, Pohang, University of Science and Technology, Pohang, Korea;

    Future Chips Constellation, Department of Electrical, Computer, and Systems, Engineering, Rensselaer Polytechnic Institute, Troy, NY, USA;

    Future Chips Constellation, Department of Electrical, Computer, and Systems, Engineering, Rensselaer Polytechnic Institute, Troy, NY, USA;

    Future Chips Constellation, Department of Electrical, Computer, and Systems, Engineering, Rensselaer Polytechnic Institute, Troy, NY, USA;

    $^{4}$LED Business, Samsung Electronics, Yongin, Korea;

    LED Business, Samsung Electronics, Yongin, Korea;

    Department of Materials Science and Engineering, Pohang, University of Science and Technology, Pohang, Korea;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Gallium nitride; Electric fields; Quantum well devices; Light emitting diodes; Epitaxial growth; Thickness measurement;

    机译:氮化镓;电场;量子阱器件;发光二极管;外延生长;厚度测量;

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