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机译:GaInN / GaN发光二极管多量子阱有源区中量子势垒厚度的影响
$^{1}$ Future Chips Constellation, Department of Electrical, Computer, and Systems, Engineering, Rensselaer Polytechnic Institute, Troy, NY , USA;
$^{2}$ Department of Materials Science and Engineering, Pohang, University of Science and Technology, Pohang, Korea;
Future Chips Constellation, Department of Electrical, Computer, and Systems, Engineering, Rensselaer Polytechnic Institute, Troy, NY, USA;
Future Chips Constellation, Department of Electrical, Computer, and Systems, Engineering, Rensselaer Polytechnic Institute, Troy, NY, USA;
Future Chips Constellation, Department of Electrical, Computer, and Systems, Engineering, Rensselaer Polytechnic Institute, Troy, NY, USA;
$^{4}$LED Business, Samsung Electronics, Yongin, Korea;
LED Business, Samsung Electronics, Yongin, Korea;
Department of Materials Science and Engineering, Pohang, University of Science and Technology, Pohang, Korea;
Gallium nitride; Electric fields; Quantum well devices; Light emitting diodes; Epitaxial growth; Thickness measurement;
机译:V缺陷对势垒层厚度变化的InGaN / GaN多量子阱发光二极管性能下降的影响
机译:通过GaN / InalGaN / GaN多屏障改进了基于IngaN的多量子孔发光二极管的光输出功率
机译:GaN / InAlGaN / GaN多重势垒提高了基于InGaN的多量子阱发光二极管的光输出功率
机译:多量子势垒对InGaN / GaN多量子阱发光二极管性能的影响
机译:GaN基发光二极管和垂直腔表面发射激光器的量子效率增强。
机译:InGaN / GaN多量子阱发光二极管中的光电性能变化:电位波动的影响
机译:V缺陷对势垒层厚度变化的InGaN_GaN多量子阱发光二极管性能下降的影响