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Effects of nonuniform distribution of quantum well and quantum wire base on infrared photodetectors under dark conditions

机译:在黑暗条件下,量子阱和量子线的不均匀分布对红外光电探测器的影响

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This paper presents the effects of uniformity and nonuniformity distribution of quantum well (QW) and wire (QR) base on quantum infrared photodetectors under dark conditions. These detectors are quantum well infrared photodetectors (QWIP) and quantum wire infrared photodetectors (QRIP). Analytical expressions for dark current characteristics of the considered devices are implemented. Additionally, the proposed results are validated against published results in literature and high agreement is accomplished. The potential distribution in QWIP active region depends on weak non-locality approach. Also, the effect of electrons concentration above the barriers on the performance of QRIP is considered. The nonuniformity parameter of QRIP is computed. Moreover, the uniformity and nonuniformity distributions effects of QRs and QWs on dark current ratio between QRIP and QWIP are estimated. This current ratio is changed by uniformity and nonuniformity distribution of QWs and QRs. It is noted that dark current ratio between QRIP and QWIP decreases with applied bias voltage. Hence, the QWIP device is affected by applied bias voltage greater than QRIP. However, this current ratio increases with temperature. Accordingly, the QRIP device is influenced by temperature larger than QWIP. It is noticed that dark current ratio under uniformity distribution is smaller than this ratio under nonuniformity distribution for both QRs and QWs. So, the nonuniformity problem within QRs is a great challenge that must be addressed. Also, the nonuniformity distribution introduces limits to QRIP device characteristics. The results demonstrate that zero value of dark current ratio is attained with zero value of nonuniformity parameter. Also, the dark current of QRIPs is found to be greater than of QWIP structures under large variation of nonuniformity distribution. Even though, this parameter is approximated to 1 under uniform distribution of QWs and QRs. It is observed that nonuniformity distribution parameter is vanished up to 80 K. So, the dependence of the operating temperature on the number of electrons occupied by each QR is evaluated. The obtained results confirm that the applied bias voltage decreases this challenge to some extent. Besides, parameters optimization for QWIPs and QRIP is of primary concern. Therefore, the devices performance is improved. Consequently, the operations of underlined infrared photodetectors are robust against noise sources in far infrared spectrum.
机译:本文介绍了在黑暗条件下,基于量子红外光电探测器的量子阱(QW)和导线(QR)的均匀性和非均匀性分布的影响。这些探测器是量子阱红外光电探测器(QWIP)和量子线红外光电探测器(QRIP)。实现了所考虑器件的暗电流特性的解析表达式。此外,所提出的结果与文献中发表的结果进行了验证,并且达到了很高的一致性。 QWIP有源区中的电位分布取决于弱非局部方法。此外,考虑了电子在壁垒上方的浓度对QRIP性能的影响。计算QRIP的非均匀性参数。此外,估计了QRs和QWs的均匀性和非均匀性分布对QRIP和QWIP之间暗电流比的影响。该电流比通过QW和QR的均匀性和不均匀性分布而改变。注意,QRIP和QWIP之间的暗电流比随施加的偏置电压而降低。因此,QWIP设备受到大于QRIP的偏置电压的影响。但是,该电流比随温度增加。因此,QRIP设备受到大于QWIP的温度的影响。注意到,对于QR和QW,在均匀分布下的暗电流比均小于在非均匀分布下的暗电流比。因此,QR中的非均匀性问题是必须解决的巨大挑战。同样,不均匀分布也对QRIP设备特性造成了限制。结果表明,非均匀性参数为零时,暗电流比为零。同样,在不均匀分布的大变化下,QRIPs的暗电流大于QWIP结构。即使在QW和QR的均匀分布下,此参数也近似为1。观察到不均匀分布参数消失到80K。因此,评估了工作温度对每个QR占据的电子数的依赖性。获得的结果证实所施加的偏置电压在某种程度上降低了这一挑战。此外,QWIP和QRIP的参数优化也是首要考虑的问题。因此,提高了设备​​性能。因此,带下划线的红外光电探测器的操作可抵抗远红外光谱中的噪声源。

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