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Numerical calculations and RF characteristics measurement of complex-conjugate impedance antenna system for ICRF heating and current drive

机译:用于ICRF加热和电流驱动的复共轭阻抗天线系统的数值计算和RF特性测量

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摘要

Characteristics of a complex-conjugate impedance antenna system for ion cyclotron resonance frequency (ICRF) heating and current drive (H & CD) are discussed in this paper. Large RF power is reflected in such transitions as that of ELMy H-L mode due to the large change in plasma resistance during the ICRF H & CD. In such a case the RF power injection to the plasma must be ceased in order to protect the tetrode vacuum tubes. The idea of a complex-conjugate impedance antenna system to mitigate the large reflected RF power, referred to as ELM tolerance, has recently been proposed. It has been proved that the reflected RF power fraction can be reduced even during a large change in plasma resistance. But it is not reduced to the level allowable for the tetrode tubes. Therefore, an improved system adding a single stub tuner is proposed. Using it, the reflected RF power fraction can be reduced to the allowable level. Numerical calculations and experiments are carried out for this system. It is found that the experimental data agree with numerical calculations.
机译:本文讨论了用于离子回旋共振频率(ICRF)加热和电流驱动(H&CD)的复共轭阻抗天线系统的特性。由于ICRF H和CD期间等离子体电阻的巨大变化,因此大的RF功率反映在诸如ELMy H-L模式的过渡中。在这种情况下,必须停止向等离子体的RF功率注入,以保护四极真空管。最近已经提出了用于减轻大的反射RF功率的复共轭阻抗天线系统的想法,称为ELM容限。业已证明,即使在等离子电阻发生较大变化时,反射的射频功率分数也可以降低。但这并没有降低到四极管允许的水平。因此,提出了一种改进的系统,该系统增加了单个存根调谐器。使用它,可以将反射的RF功率分数降低到允许水平。为此系统进行了数值计算和实验。发现实验数据与数值计算吻合。

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  • 来源
    《Nuclear fusion》 |2011年第5期|p.51-59|共9页
  • 作者单位

    Institute of Plasma Physics, Academia Sinica, Hefei, Anhui 230031, People's Republic of China;

    Institute of Plasma Physics, Academia Sinica, Hefei, Anhui 230031, People's Republic of China;

    Institute of Plasma Physics, Academia Sinica, Hefei, Anhui 230031, People's Republic of China;

    Institute of Plasma Physics, Academia Sinica, Hefei, Anhui 230031, People's Republic of China;

    Institute of Plasma Physics, Academia Sinica, Hefei, Anhui 230031, People's Republic of China;

    Institute of Plasma Physics, Academia Sinica, Hefei, Anhui 230031, People's Republic of China;

    Institute of Plasma Physics, Academia Sinica, Hefei, Anhui 230031, People's Republic of China;

    Institute of Plasma Physics, Academia Sinica, Hefei, Anhui 230031, People's Republic of China;

    Korea Atomic Energy Research Institute, Daejeon 305-353, Korea;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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