Characteristics of nickel tip carbon nanorod growth by pulsed plasma chemical vapor deposition

摘要

Growth of nickel tip carbon nanorod by means of pulsed plasma chemical vapor deposition (PPCVD) was carried out at different deposition time. Effects of deposition time under the methane plasma on the growth of carbon nanorod were investigated. The nucleation and growth mechanism of nickel tip carbon nanorod were also discussed. Nanoparticles were formed on substrate to introduce more nucleation sites at an elevated deposition time, and the density of nanorod on the surface of the substrate was greatly increased until the proper methane plasma deposition time. The longest nanorods and the highest nanorods density were found after methane plasma treatment of 3 min and 10 min respectively. Nanorod was about 60 nanometers in diameter and about 550 nanometers in length. Nanorods had onion and V-shape with Ni tip.