Characterising aluminium oxide barrier layers on flexible substrates deposited by atomic layer deposition

摘要

The optical and mechanical properties of aluminium oxide barrier layers are characterised in this work. Atomic layer deposition is utilised to grow high-performance aluminium oxide (Al2O3) barrier films on flexible polyethylene terephthalate substrates, where the effects of precursor pulse time and deposition temperature on the film properties are also studied. Significant observations on the surface roughness, optical transmittance, adhesion and the mechanical properties of the deposited films are also conducted. The results show that the Al2O3 film deposited with a 10 ms precursor pulse time and a 60 degrees C deposition temperature gives the best performance.