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Cross-sectioning spatio-temporal Co-In electrodeposits: Disclosing a magnetically-patterned nanolaminated structure

机译:横截面时空Co-In电沉积:揭示磁性图案的纳米层状结构

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Micrometer-thick cobalt-indium (Co-In) films consisting of self-assembled layers parallel to the cathode plane, and with a periodicity of 175 +/- 25 nm, were fabricated by electrodeposition at a constant current density. These films, which exhibit spatio-temporal patterns on the surface, grow following a layer-by-layer mode. Films cross-sections were characterized by electron microscopies and electron energy loss spectroscopy. Results indicate the spontaneous formation of nanolayers that span the whole deposit thickness. A columnar structure was revealed inside each individual nanolayer which, in turn, was composed of well-distinguished In-and Co-rich regions. Due to the dissimilar magnetic character of these regions, a periodic magnetic nanopatterning was observed in the cross-sectioned films, as shown by magnetic force microscopy studies. (C) 2016 Elsevier Ltd. All rights reserved.
机译:通过在恒定电流密度下进行电沉积,制备了微米厚度的钴-铟(Co-In)薄膜,该薄膜由平行于阴极平面的自组装层组成,并且具有175 +/- 25 nm的周期性。这些薄膜在表面上显示出时空图案,并按照逐层模式生长。膜的横截面通过电子显微镜和电子能量损失谱进行表征。结果表明跨越整个沉积物厚度的纳米层的自发形成。在每个单独的纳米层内部都显示出柱状结构,而柱状结构又由明显区分的富内和富钴区域组成。由于这些区域的磁性不同,如磁力显微镜研究所示,在横截面膜中观察到周期性的磁性纳米图案。 (C)2016 Elsevier Ltd.保留所有权利。

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