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首页> 外文期刊>Journal of Membrane Science >Fundamental studies of a new hybrid (inorganic-organic) positively charged membrane. Ⅱ. Membrane preparation via alcoholysis reaction and amination processes of silicone and titanate coupling agents
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Fundamental studies of a new hybrid (inorganic-organic) positively charged membrane. Ⅱ. Membrane preparation via alcoholysis reaction and amination processes of silicone and titanate coupling agents

机译:新型杂化(无机-有机)带正电膜的基础研究。 Ⅱ。通过醇解反应和有机硅和钛酸酯偶联剂的胺化过程制备膜

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摘要

A series of novel inorganic-organic hybrid positively charged membranes were prepared by coupling of 3-glycidoxypropyltrimethoxysilane (GPTMS) and mixed GPTMS/Ti(O-n-C_4H_9)_4 in n-butyl alcohol (BuOH) solution at various temperatures and then followed quaternary amination with trimethyl amine (TMA). The synthesized membranes were characterized by IEC, streaming potential, pure water flux, FT-IR, TGA measurements as well as SEM observations. It was exhibited that anion exchange capacities (IECs) of the membranes decreased with increasing curing temperature within a range of (1.4-3.1) x 10~(-2)mequiv. cm~(-2) coated for one time and (3.5-4.6) x 10~(-2) mequiv. cm~(-2) coated for two times. The positive charge of the membranes was approved by these IEC values as well as FT-IR spectrum of step products and streaming potential values. The thermal stability was tested by TGA analysis and showed that the membranes doped with titanium could undergo a curing temperature up to 300℃. Pure water flux showed that they decreased with increasing curing temperature, the composition of precursor and dip-coating times, respectively. SEM observations indicated that the membranes became thicker and denser with increasing content of titanium, but excessive Ti-content would decrease the stability of Si—O—Ti bonds in the membranes.
机译:通过在不同温度下将3-环氧丙氧基丙基三甲氧基硅烷(GPTMS)和混合的GPTMS / Ti(On-C_4H_9)_4混合在正丁醇(BuOH)溶液中制备一系列新颖的无机-有机杂化带正电膜与三甲胺(TMA)。合成的膜通过IEC,流动电势,纯水通量,FT-IR,TGA测量以及SEM观察进行表征。结果表明,在(1.4-3.1)x 10〜(-2)mequiv范围内,膜的阴离子交换容量(IECs)随着固化温度的升高而降低。 cm〜(-2)涂一次并(3.5-4.6)x 10〜(-2)mequiv。 cm〜(-2)涂两次。这些IEC值,阶跃产物的FT-IR光谱和流动电势值均认可了膜的正电荷。通过TGA分析测试其热稳定性,结果表明掺杂钛的膜可以经受高达300℃的固化温度。纯水通量表明它们分别随着固化温度,前驱体组成和浸涂时间的增加而降低。 SEM观察表明,随着钛含量的增加,膜变得更厚,更致密,但是过多的Ti含量会降低膜中Si-O-Ti键的稳定性。

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