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A structural model of ultra- microelectrodes for shear-force based scanning electrochemical microscopy

机译:基于超微电极的剪切力扫描电化学显微镜结构模型

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The incorporation of a shear-force (SF) feedback in scanning electrochemical microscopy (SECM) hardware has enabled topographically resolved electrochemical imaging of electroactive substrates. Despite the versatility of SECM-SF imaging, structural response of the ultra-microelectrode (UME) to various excitation inputs is poorly understood and predictive mathematical models for characterizing dynamic behavior, particularly at high operating frequencies (100 kHz), are absent. In this article, we present a finite element model to characterize SF behavior by modeling the UME as a rigid cantilever with two distributed piezoelectric wafers (dither and receiver) and demonstrate the model's ability to predict experimentally observed SF behavior. The obtained SF response under different dither-to-receiver distances for various UME geometries and loading conditions provides insight to the optimum placement of piezoelectric wafers on the UME for achieving a high SF amplitude at SF-sensitive frequencies. In addition, the variations in SF response under different dither-to-receiver orientations indicate the existence of a system transfer function that is dependent on the operating modes of the receiver. The agreement between simulated and experimental results suggests that the finite element model along with the experimental methodology can be extended to automated SF imaging using SECM hardware.
机译:在扫描电化学显微镜(SECM)硬件中并入了剪切力(SF)反馈,从而可以对电活性基材进行地形分辨的电化学成像。尽管SECM-SF成像具有多功能性,但对超微电极(UME)对各种激励输入的结构响应知之甚少,并且缺乏用于表征动态行为的预测数学模型,尤其是在高工作频率(> 100 kHz)时。在本文中,我们提出了一个有限元模型,通过将UME建模为带有两个分布式压电晶片(抖动和接收器)的刚性悬臂,来表征SF行为,并展示了该模型具有预测实验观察到的SF行为的能力。在各种UME几何形状和负载条件下,在不同的抖动到接收器距离下获得的SF响应为在UME上压电晶片的最佳放置提供了见识,以在SF敏感的频率上实现高SF振幅。此外,在不同的抖动到接收器方向下,SF响应的变化表明系统传递函数的存在取决于接收器的工作模式。模拟结果和实验结果之间的一致性表明,有限元模型和实验方法可以扩展到使用SECM硬件进行的自动SF成像。

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