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Analog and RF performance of doping-less tunnel FETs with Si0.55Ge0.45 source

机译:具有Si0.55Ge0.45源的无掺杂隧道FET的模拟和RF性能

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This paper reports studies of a doping-less tunnel field-effect transistor (TFET) with a Si0.55Ge0.45 source structure aimed at improving the performance of charge-plasma-based doping-less TFETs. The proposed device achieves an improved ON-state current ( ION similar to 4.88 x 10(-5) A/mu m), an I-ON/I-OFF ratio of 6.91 x 10(12), an average subthreshold slope (AV-SS) of similar to 64.79mV/dec, and a point subthreshold slope (SS) of 14.95 mV/dec. This paper compares the analog and radio of frequency (RF) parameters of this device with those of a conventional doping-less TFET (DLTFET), including the transconductance (gm), transconductance-to-drain-current ratio (g(m)/I-D), output conductance (g(d)), intrinsic gain (A(V)), early voltage (VEA), total gate capacitance (C-gg), and unity-gain frequency (fT). Based on the simulated results, the Si0.55Ge0.45-source DLTFET is found to offer superior analog as well as RF performance.
机译:本文报道了一种具有Si0.55Ge0.45源极结构的无掺杂隧道场效应晶体管(TFET)的研究,旨在改善基于电荷等离子体的无掺杂TFET的性能。拟议中的器件实现了改善的导通状态电流(ION类似于4.88 x 10(-5)A /μm),I-ON / I-OFF比为6.91 x 10(12),平均亚阈值斜率(AV) -SS)类似于64.79mV / dec,点亚阈值斜率(SS)为14.95 mV / dec。本文将该器件的模拟和射频参数与常规的无掺杂TFET(DLTFET)进行了比较,包括跨导(gm),跨导与漏极电流之比(g(m)/ ID),输出电导(g(d)),固有增益(A(V)),早期电压(VEA),总栅极电容(C-gg)和单位增益频率(fT)。根据仿真结果,发现Si0.55Ge0.45源DLTFET具有出色的模拟和RF性能。

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