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A numerical analysis of progressive and abrupt reset in conductive bridging RRAM

机译:导电桥接RRAM中渐进式和突然式复位的数值分析

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The authors investigate the conduction filament (CF) properties of a Cu- based conductive bridging resistive memory device by implementing a numerical simulation of the low and high resistive states, starting from a random initial distribution of oxygen vacancies (OV) defects states in the resistive switching layer (RSL) to a formed CF and ending in a ruptured state. A calculation approach which accounts for both the statistical nature of the system and the synergetic effect of OV and Cu species on the overall conductance is presented. By defining a disorder parameter, the correlation between the OV initial distribution and the CF reset behavior is analyzed. A dependence of the reset transition, being either abrupt or progressive, on the physical shape of the CF which in turn is affected by this disorder is shown to exist based on the simulation results.
机译:作者通过实施低和高电阻状态的数值模拟,从电阻中氧空位(OV)缺陷状态的随机初始分布开始,研究了基于铜的导电桥式电阻存储设备的导电丝(CF)特性。开关层(RSL)形成的CF,并以破裂状态结束。提出了一种计算方法,该方法考虑了系统的统计性质以及OV和Cu物种对整体电导的协同作用。通过定义无序参数,可以分析OV初始分布与CF复位行为之间的相关性。根据仿真结果,表明存在突然或渐进的复位过渡对CF的物理形状的依赖性,而CF的物理形状又受该病症的影响。

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