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机译:在氢氟酸溶液中蚀刻而在n-Si {100}中产生的孔的形貌
Moscow Technol Univ, Inst Fine Chem Technol, Pr Vernadskogo 86, Moscow 119571, Russia;
Moscow Technol Univ, Inst Fine Chem Technol, Pr Vernadskogo 86, Moscow 119571, Russia;
Moscow Technol Univ, Inst Fine Chem Technol, Pr Vernadskogo 86, Moscow 119571, Russia;
Moscow Technol Univ, Inst Fine Chem Technol, Pr Vernadskogo 86, Moscow 119571, Russia;
Moscow Technol Univ, Inst Fine Chem Technol, Pr Vernadskogo 86, Moscow 119571, Russia;
porous silicon; pore size; pore contours; mathematical model;
机译:氢氟酸溶液中X-射线光化学湿法蚀刻n-Si(100)
机译:氢氟酸溶液中电化学蚀刻在其电化学蚀刻过程中底物质晶体取向对氢氢溶液中硅孔的影响
机译:用氢氟酸溶液在其电化学蚀刻中硅中孔形成孔中(HF2)( - )离子的确定作用
机译:氟化铵溶液中n-Si(100)上宏观微沟槽的光电子蚀刻
机译:一维硅纳米线的细胞响应以及在纳米线生长之前用氢氟酸蚀刻硅(111)基板的效果。
机译:氢氟酸蚀刻时间对牙科陶瓷表面微观形貌粗糙度和润湿性的影响
机译:氢氟酸蚀刻时间对牙科陶瓷表面微观形貌,粗糙度和润湿性的影响