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首页> 外文期刊>IEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control >Effect of crystal orientation on lapping and polishing processes of natural quartz
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Effect of crystal orientation on lapping and polishing processes of natural quartz

机译:晶体取向对天然石英研磨抛光工艺的影响

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摘要

Lapping and polishing processes of natural quartz are investigated in relation to crystallographic orientation and applied normal stress. Weight loss measurements and surface profilometry were carried out in X-, Y-, Z-, and AT-cut samples. The relationship found between material removal rate and stress depends on specimen orientation. Based on indentation fracture mechanics, this behavior is discussed in relation to fracture toughness and scratch hardness anisotropy of quartz crystals. Scanning electron microscopy (SEM) shows that brittle microcracking is the primary mechanism involved with material removal in the lapping process. Plastic deformation mechanisms begin to operate on lapped and polished surfaces above a certain value of stress. Surface profiles and SEM micrographs show that the roughness of lapped surfaces decreases with increasing normal stress, but an opposite behavior is observed in polished surfaces.
机译:研究了天然石英的研磨和抛光工艺与晶体学取向和所施加的法向应力的关系。在X,Y,Z和AT切割样品中进行重量损失测量和表面轮廓测定。材料去除率和应力之间的关系取决于样品的方向。基于压痕断裂力学,讨论了这种行为与石英晶体的断裂韧性和划痕硬度各向异性的关系。扫描电子显微镜(SEM)表明,脆性微裂纹是研磨过程中材料去除的主要机理。塑性变形机制开始在超过一定应力值的研磨和抛光表面上起作用。表面轮廓和SEM显微照片显示,研磨表面的粗糙度随法向应力的增加而减小,但在抛光表面观察到相反的行为。

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