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首页> 外文期刊>IEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control >Fabrication and characterization of micromachined high-frequency tonpilz transducers derived by PZT thick films
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Fabrication and characterization of micromachined high-frequency tonpilz transducers derived by PZT thick films

机译:PZT厚膜衍生的微加工高频tonpilz换能器的制备与表征

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Miniaturized tonpilz transducers are potentially useful for ultrasonic imaging in the 10 to 100 MHz frequency range due to their higher efficiency and output capabilities. In this work, 4 to 10-/spl mu/m thick piezoelectric thin films were used as the active element in the construction of miniaturized tonpilz structures. The tonpilz stack consisted of silver/lead zirconate titanate (PZT)/lanthanum nickelate (LaNiO/sub 3/)/silicon on insulator (SOI) substrates. First, conductive LaNiO/sub 3/ thin films, approximately 300 nm in thickness, were grown on SOI substrates by a metalorganic decomposition (MOD) method. The room temperature resistivity of the LaNiO/sub 3/ was 6.5 /spl times/ 10/sup -6/ /spl Omega//spl middot/m. Randomly oriented PZT (52/48) films up to 7-/spl mu/m thick were then deposited using a sol-gel process on the LaNiO/sub 3/-coated SOI substrates. The PZT films with LaNiO/sub 3/ bottom electrodes showed good dielectric and ferroelectric properties. The relative dielectric permittivity (at 1 kHz) was about 1030. The remanent polarization of PZT films was larger than 26 /spl mu/C/cm/sup 2/. The effective transverse piezoelectric e/sub 31,f/ coefficient of PZT thick films was about -6.5 C/m/sup 2/ when poled at -75 kV/cm for 15 minutes at room temperature. Enhanced piezoelectric properties were obtained on poling the PZT films at higher temperatures. A silver layer about 40-/spl mu/m thick was prepared by silver powder dispersed in epoxy and deposited onto the PZT film to form the tail mass of the tonpilz structure. The top layers of this wafer were subsequently diced with a saw, and the structure was bonded to a second wafer. The original silicon carrier wafer was polished and etched using a Xenon difluoride (XeF/sub 2/) etching system. The resulting structures showed good piezoelectric activity. This process flow should enable integration of the piezoelectric elements with drive/receive electronics.
机译:小型化的tonpilz换能器因其更高的效率和输出能力而潜在地可用于10至100 MHz频率范围的超声成像。在这项工作中,使用4至10- / splμm/ m厚的压电薄膜作为微型tonpilz结构的有源元件。 tonpilz叠层由银/锆钛酸铅(PZT)/镍酸镧(LaNiO / sub 3 /)/绝缘体上的硅(SOI)衬底组成。首先,通过金属有机分解(MOD)方法在SOI衬底上生长厚度约为300 nm的导电LaNiO / sub 3 /薄膜。 LaNiO / sub 3 /的室温电阻率为6.5 / spl倍/ 10 / sup -6 / / splΩ// spl中点/ m。然后使用溶胶-凝胶工艺在LaNiO / sub 3 /涂层的SOI衬底上沉积厚度高达7 / splμm/ m的随机取向的PZT(52/48)膜。具有LaNiO / sub 3 /底部电极的PZT膜表现出良好的介电和铁电性能。相对介电常数(在1 kHz时)约为1030。PZT膜的剩余极化大于26 / spl mu / C / cm / sup 2 /。当在室温下以-75 kV / cm极化15分钟时,PZT厚膜的有效横向压电e / sub 31,f /系数约为-6.5 C / m / sup 2 /。在较高的温度下极化PZT膜可获得增强的压电性能。通过将银粉分散在环氧树脂中并沉积到PZT膜上以形成tonpilz结构的尾料,制备出约40- / splμm/ m厚的银层。随后用锯将该晶片的顶层切成小块,并将该结构粘结到第二晶片上。使用二氟化氙(XeF / sub 2 /)蚀刻系统对原始的硅载体晶圆进行抛光和蚀刻。所得结构显示出良好的压电活性。该处理流程应能够使压电元件与驱动/接收电子设备集成在一起。

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